Recent progress in red light-emitting diodes by III-nitride materials

被引:52
|
作者
Iida, Daisuke [1 ]
Ohkawa, Kazuhiro [1 ]
机构
[1] King Abdullah Univ Sci & Technol KAUST, Comp Elect & Math Sci & Engn CEMSE Div, Thuwal 239556900, Saudi Arabia
关键词
InGaN; metalorganic vapor-phase epitaxy; red light-emitting diodes; full width at half maximum; peak wavelength shift; EXTERNAL QUANTUM EFFICIENCY; VAPOR-PHASE EPITAXY; INGAN GREEN LEDS; HIGH-QUALITY; SURFACE RECOMBINATION; PIEZOELECTRIC FIELDS; EMISSION WAVELENGTH; LASER-DIODES; CW OPERATION; MOVPE GROWTH;
D O I
10.1088/1361-6641/ac3962
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
GaN-based light-emitting devices have the potential to realize all visible emissions with the same material system. These emitters are expected to be next-generation red, green, and blue displays and illumination tools. These emitting devices have been realized with highly efficient blue and green light-emitting diodes (LEDs) and laser diodes. Extending them to longer wavelength emissions remains challenging from an efficiency perspective. In the emerging research field of micro-LED displays, III-nitride red LEDs are in high demand to establish highly efficient devices like conventional blue and green systems. In this review, we describe fundamental issues in the development of red LEDs by III-nitrides. We also focus on the key role of growth techniques such as higher temperature growth, strain engineering, nanostructures, and Eu doping. The recent progress and prospect of developing III-nitride-based red light-emitting devices will be presented.
引用
收藏
页数:29
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