Development of magnetic tunnel junction for toggle MRAM

被引:10
|
作者
Kim, HJ [1 ]
Oh, SC [1 ]
Bae, JS [1 ]
Nam, KT [1 ]
Lee, JE [1 ]
Park, SO [1 ]
Kim, HS [1 ]
Lee, NI [1 ]
Chung, UI [1 ]
Moon, JT [1 ]
Kang, HK [1 ]
机构
[1] Samsung Elect Co Ltd, Adv Proc Dev, Proc Dev Team, Yongin 449711, South Korea
关键词
exchange coupling field; magnetic anisotropy field; magnetic tunnel junction (MTJ); toggle MRAM;
D O I
10.1109/TMAG.2005.854935
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Toggle switching mode MRAM is tested and characterized with respect to the free- and pinned-layer material,and thickness. With magnetization curves, we were able to find the optimum thickness combinations of free-layer and spacer materials. For CoFeB where the intrinsic anisotropy field (Hi) is about 20-30 Oe, one needs to have a reasonably high exchange coupling field (Hex) to ensure large switching margin. In case of an NiFe/Ru/NiFe free-layer, Hi is usually much smaller than Hex, so that further decrease of Hex between two magnetic layers is needed. The pinned-layer roughness and thickness are other factors to be optimized to reduce the toggle switching field. High cell aspect ratio >= 3.0 helps to minimize the switching distribution and enhance the switching stability.
引用
收藏
页码:2661 / 2663
页数:3
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