Defect-related photoluminescence of silicon nanoparticles produced by pulsed ion-beam ablation in vacuum

被引:6
|
作者
Zhu, XP [1 ]
Yukawa, T [1 ]
Hirai, M [1 ]
Suzuki, T [1 ]
Suematsu, H [1 ]
Jiang, WH [1 ]
Yatsui, K [1 ]
机构
[1] Nagaoka Univ Technol, Extreme Energy Dens Res Inst, Nagaoka, Niigata 9402188, Japan
关键词
Si nanoparticle; photoluminescence; pulsed ion-beam evaporation; ablation plasma;
D O I
10.1016/j.apsusc.2004.08.019
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Visible light emission has been observed from Si nanoparticles produced using an intense pulsed ion-beam evaporation (IBE) technique in vacuum. The as-prepared Si nanoparticles possess good crystallinity without any post-annealing. Room-temperature photoluminescence (PL) spectra for the Si nanoparticles were registered in blue-green range. The average crystal size (around 20 nm) estimated from glancing angle X-ray diffraction (GAXRD) was relatively large, inconsistent with quantum size effect for the light emission. The Si nanoparticles was exposed to O-2 gas at elevated temperature and hydrofluoric acid (HF) vapor at room temperature for examining the PL source, where significant deterioration of PL intensity was found subsequently. Combined with analyses of X-ray photoelectron spectroscopy (XPS) and energy dispersive X-ray spectroscopy (EDX), the PL is attributable to oxide defects of the samples. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:256 / 260
页数:5
相关论文
共 50 条
  • [41] EFFECT OF BEAM ENERGY AND ANNEAL HISTORY ON TRIVALENTLY BONDED SILICON DEFECT CENTERS INDUCED BY ION-BEAM ETCHING
    SINGH, R
    FONASH, SJ
    CAPLAN, PJ
    POINDEXTER, EH
    APPLIED PHYSICS LETTERS, 1983, 43 (05) : 502 - 504
  • [42] Solutions to defect-related problems in implanted silicon by controlled injection of vacancies by high-energy ion irradiation
    Roth, EG
    Holland, OW
    Duggan, JL
    APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 1999, 475 : 804 - 809
  • [43] Photoluminescence analysis of colloidal silicon nanoparticles in ethanol produced by double-pulse ns laser ablation
    Momeni, Ashkan
    Mahdieh, Mohammad Hossein
    JOURNAL OF LUMINESCENCE, 2016, 176 : 136 - 143
  • [44] GROWTH OF SILICON HOMOEPITAXIAL THIN-FILMS BY ULTRAHIGH-VACUUM ION-BEAM SPUTTER DEPOSITION
    SCHWEBEL, C
    MEYER, F
    GAUTHERIN, G
    PELLET, C
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (05): : 1153 - 1158
  • [45] OPTICAL-PROPERTIES OF THIN AMORPHOUS-SILICON AND AMORPHOUS HYDROGENATED SILICON FILMS PRODUCED BY ION-BEAM TECHNIQUES
    MARTIN, PJ
    NETTERFIELD, RP
    SAINTY, WG
    MCKENZIE, DR
    THIN SOLID FILMS, 1983, 100 (02) : 141 - 147
  • [46] Preparation of silicon thin films by intense pulsed ion-beam evaporation method with low temperature process
    Lee, Jung-Hui
    Chu, Byung-Yoon
    Choi, Byoung-Jung
    Yang, Sung-Chae
    SURFACE & COATINGS TECHNOLOGY, 2007, 201 (9-11): : 4961 - 4964
  • [47] HIGH-INTENSITY FREQUENCY-PULSED ION-BEAM CREATION AND INVESTIGATION ON THE BASE OF VACUUM-ARC
    ARZUBOV, NM
    ISAYEV, GP
    RYABCHIKOV, AI
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII FIZIKA, 1989, 32 (08): : 68 - 74
  • [48] X-ray photoelectron spectroscopy characterization of oxidated Si particles formed by pulsed ion-beam ablation
    Zhu, XP
    Yukawa, T
    Hirai, M
    Suematsu, H
    Jiang, WH
    Yatsui, K
    Nishiyama, H
    Inoue, Y
    APPLIED SURFACE SCIENCE, 2006, 252 (16) : 5776 - 5782
  • [49] Silicon nitride films produced by ion-beam assisted deposition: Bulk and near-surface composition
    Grigorov, GI
    Grigorov, KG
    Bouchier, D
    Vignes, JL
    Langeron, JP
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 108 (1-2): : 85 - 86
  • [50] A MODEL FOR SOME DEFECT-RELATED BOUND EXCITON LINES IN THE PHOTOLUMINESCENCE SPECTRUM OF GAAS-LAYERS GROWN BY MOLECULAR-BEAM EPITAXY
    EAVES, L
    HALLIDAY, DP
    JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1984, 17 (27): : L705 - L709