Defect-related photoluminescence of silicon nanoparticles produced by pulsed ion-beam ablation in vacuum

被引:6
|
作者
Zhu, XP [1 ]
Yukawa, T [1 ]
Hirai, M [1 ]
Suzuki, T [1 ]
Suematsu, H [1 ]
Jiang, WH [1 ]
Yatsui, K [1 ]
机构
[1] Nagaoka Univ Technol, Extreme Energy Dens Res Inst, Nagaoka, Niigata 9402188, Japan
关键词
Si nanoparticle; photoluminescence; pulsed ion-beam evaporation; ablation plasma;
D O I
10.1016/j.apsusc.2004.08.019
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Visible light emission has been observed from Si nanoparticles produced using an intense pulsed ion-beam evaporation (IBE) technique in vacuum. The as-prepared Si nanoparticles possess good crystallinity without any post-annealing. Room-temperature photoluminescence (PL) spectra for the Si nanoparticles were registered in blue-green range. The average crystal size (around 20 nm) estimated from glancing angle X-ray diffraction (GAXRD) was relatively large, inconsistent with quantum size effect for the light emission. The Si nanoparticles was exposed to O-2 gas at elevated temperature and hydrofluoric acid (HF) vapor at room temperature for examining the PL source, where significant deterioration of PL intensity was found subsequently. Combined with analyses of X-ray photoelectron spectroscopy (XPS) and energy dispersive X-ray spectroscopy (EDX), the PL is attributable to oxide defects of the samples. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:256 / 260
页数:5
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