Crystalline Core/Shell Si/SiO2 Nanotubes Formed via Interfacial Stress Imbalance

Crystalline core/shell Si/SiO2 nanotubes (NTs) with outer diameters of 130-220 nm and lengths of similar to 1 mu m have been synthesized using thermal evaporation. High resolution scanning electron microscopy reveals that the NT formation stems from the intrinsic interfacial stress imbalance in the strained Si/SiO2 bilayered film, consequently leading to NTs with different orifice levels. The NT diameters depend strongly on the bilayer film thicknesses and crystal orientations of the Si and SiO2 layers. A modified Timoshenko formula is derived to calculate the dependence of the tube diameter on the bilayer film thickness. The obtained results are consistent well with experimental data.