Laser ablated Ni-doped HfO2 thin films:: Room temperature ferromagnets -: art. no. 242505

被引：56
|
作者：
Hong, NH
Sakai, J
Poirot, N
Ruyter, A
机构：
[1] Univ Tours, CEA, CNRS, UMR 6157,Lab LEMA, F-37200 Tours, France
[2] JAIST, Sch Mat Sci, Nomi, Ishikawa 9231292, Japan
[3] IUT Blois, F-41029 Blois, France
来源：
APPLIED PHYSICS LETTERS | 2005年 / 86卷 / 24期
关键词：
D O I：
10.1063/1.1949723
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Laser ablated Ni- doped HfO2 thin films fabricated under a wide range of growth conditions all showed ferromagnetism above room temperature. However, the films deposited at 800 degrees C under an oxygen partial pressure of 10(-6) Torr have the largest magnetic moment of 2.7 mu(B)/Ni. Ni- doped HfO2 films also well demonstrate a large anisotropy. Magnetic force microscopy measurements confirmed that Ni- doped HfO2 films are real room temperature ferromagnets with a domain structure, and that the size of magnetic domains is larger than 10 mm. (c) 2005 American Institute of Physics.
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页码：1 / 3
页数：3
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