Growth of TiO2 nanorods by metalorganic chemical vapor deposition

被引：197

作者：

Pradhan, SK ^{[1
]}

Reucroft, PJ ^{[1
]}

Yang, FQ ^{[1
]}

Dozier, A ^{[1
]}

机构：

[1] Univ Kentucky, Dept Chem & Mat Engn, Lexington, KY 40506 USA

来源：

JOURNAL OF CRYSTAL GROWTH | 2003年 / 256卷 / 1-2期

关键词：

metalorganic chemical vapor deposition; nanorods; nanowires; titanium oxide;

D O I：

10.1016/S0022-0248(03)01339-3

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

The growth of TiO2 nanorods on a WC-Co substrate by metalorganic chemical vapor deposition has been observed by SEM and TEM. The nanorods diameter and length were about 50-100 nm and 0.5-2 mum, respectively. Nanorod growth was observed at 500degreesC, while mostly particles were deposited at 600degreesC and a thin coating was formed at 400degreesC. It appears that the presence of cobalt catalyzes the directional growth of TiO2 and NH3 enhances this growth behavior. In the presence of NH3, thinner and longer nanorod growth was observed. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：83 / 88

页数：6

共 50 条

[31] Metallorganic chemical vapor deposition and characterization of TiO2 nanoparticles
Jung, OJ
Kim, SH
Cheong, KH
Li, W
Saha, SI
BULLETIN OF THE KOREAN CHEMICAL SOCIETY, 2003, 24 (01) : 49 - 54
[32] Synthesis of TiO2 Nanowires by Metallorganic Chemical Vapor Deposition
Heo, Hun-Hoe
Hoa, Nguyen Thi Quynh
Lim, Jae-Kyun
Kim, Gil-Moo
Kim, Eui-Tae
KOREAN JOURNAL OF MATERIALS RESEARCH, 2010, 20 (12): : 686 - 690
[33] The deposition behavior of SiO2-TiO2 thin film by metalorganic chemical vapor deposition methods
Lee, SM
Park, JH
Hong, KS
Cho, WJ
Kim, DL
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (05): : 2384 - 2388
[34] Effects of electrode materials and annealing ambients on the electrical properties of TiO2 thin films by metalorganic chemical vapor deposition
Sun, SC
Chen, TF
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (3B): : 1346 - 1350
[35] Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition
Kamei, M. (KAMEI.Masayuki@nims.go.jp), 1600, Japan Society of Applied Physics (42):
[36] EPITAXIAL GROWTH OF CuGaS2 BY METALORGANIC CHEMICAL VAPOR DEPOSITION.
Hara, Kazuhiko
Kojima, Tohru
Kukimoto, Hiroshi
Japanese Journal of Applied Physics, Part 2: Letters, 1987, 26 (07):
[37] Comparative study of TiO2 anatase epitaxial thin films grown by magnetron sputtering and metalorganic chemical vapor deposition
Kamei, M
Miyagi, T
Ogawa, T
Mitsuhashi, T
Yamazaki, A
Sato, T
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (11): : 7025 - 7028
[38] Growth of GaInNAs by metalorganic chemical vapor deposition using dimethylhydrazine
Sato, S
Satoh, S
PROCEEDINGS OF THE SYMPOSIUM ON LIGHT EMITTING DEVICES FOR OPTOELECTRONIC APPLICATIONS AND THE TWENTY-EIGHTH STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS, 1998, 98 (02): : 188 - 195
[39] GROWTH OF GAINASSB ALLOYS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION
LI, SW
JIN, YX
ZHOU, TM
ZHANG, BL
NING, YQ
HONG, J
YUAN, G
ZHANG, XY
YUAN, JS
JOURNAL OF CRYSTAL GROWTH, 1995, 156 (1-2) : 39 - 44
[40] METALORGANIC CHEMICAL-VAPOR-DEPOSITION GROWTH AND CHARACTERIZATION OF GAAS
BLAAUW, C
MINER, C
EMMERSTORFER, B
SPRINGTHORPE, AJ
GALLANT, M
CANADIAN JOURNAL OF PHYSICS, 1985, 63 (06) : 664 - 669

← 1 2 3 4 5 →