Growth of TiO2 nanorods by metalorganic chemical vapor deposition

被引：197
|
作者：
Pradhan, SK [1 ]
Reucroft, PJ [1 ]
Yang, FQ [1 ]
Dozier, A [1 ]
机构：
[1] Univ Kentucky, Dept Chem & Mat Engn, Lexington, KY 40506 USA
来源：
JOURNAL OF CRYSTAL GROWTH | 2003年 / 256卷 / 1-2期
关键词：
metalorganic chemical vapor deposition; nanorods; nanowires; titanium oxide;
D O I：
10.1016/S0022-0248(03)01339-3
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
The growth of TiO2 nanorods on a WC-Co substrate by metalorganic chemical vapor deposition has been observed by SEM and TEM. The nanorods diameter and length were about 50-100 nm and 0.5-2 mum, respectively. Nanorod growth was observed at 500degreesC, while mostly particles were deposited at 600degreesC and a thin coating was formed at 400degreesC. It appears that the presence of cobalt catalyzes the directional growth of TiO2 and NH3 enhances this growth behavior. In the presence of NH3, thinner and longer nanorod growth was observed. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码：83 / 88
页数：6
相关论文
共 50 条
  • [21] Mechanism of selective area growth of GaN nanorods by pulsed mode metalorganic chemical vapor deposition
    Lin, Yen-Ting
    Yeh, Ting-Wei
    Dapkus, P. Daniel
    NANOTECHNOLOGY, 2012, 23 (46)
  • [22] Low-temperature growth and characterization of epitaxial ZnO nanorods by metalorganic chemical vapor deposition
    Kim D.C.
    Kong B.H.
    Jeon S.-Y.
    Yoo J.-B.
    Cho H.K.
    Park D.J.
    Lee J.Y.
    Journal of Materials Research, 2007, 22 (7) : 2032 - 2036
  • [23] Selective growth of TiO2 thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods
    Kang, BC
    Lee, JH
    Chae, HY
    Jung, DY
    Lee, SB
    Boo, JH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (04): : 1773 - 1776
  • [24] Growth of AlGaN nanowires by metalorganic chemical vapor deposition
    Su, J
    Gherasimova, M
    Cui, G
    Tsukamoto, H
    Han, J
    Onuma, T
    Kurimoto, M
    Chichibu, SF
    Broadbridge, C
    He, Y
    Nurmikko, AV
    APPLIED PHYSICS LETTERS, 2005, 87 (18) : 1 - 3
  • [25] Formation of TiO2 thin films using NH3 as catalyst by metalorganic chemical vapor deposition
    Jung, S.-H.
    Kang, S.-W.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (5 A): : 3147 - 3152
  • [26] Formation of TiO2 thin films using NH3 as catalyst by metalorganic chemical vapor deposition
    Jung, SH
    Kang, SW
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (5A): : 3147 - 3152
  • [27] GROWTH OF ZNS BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    FUJITA, S
    TOMOMURA, Y
    SASAKI, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (09): : L583 - L585
  • [28] VAPOR DEPOSITION OF TIO2
    YOKOZAWA, M
    IWASA, H
    TERAMOTO, I
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1968, 7 (01) : 96 - &
  • [29] Comparative studies on the growth behavior of ZnO nanorods by metalorganic chemical vapor deposition depending on the type of substrates
    Lee, DJ
    Park, JY
    Yun, YS
    Hong, YS
    Moon, JH
    Lee, BT
    Kim, SS
    JOURNAL OF CRYSTAL GROWTH, 2005, 276 (3-4) : 458 - 464
  • [30] Metallorganic chemical vapor deposition and characterization of TiO2 nanoparticles
    Li, W
    Shah, SI
    Huang, CP
    Jung, O
    Ni, C
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2002, 96 (03): : 247 - 253
12345