Optical microsystems metrology - Part II

被引：8
|
作者：
Osten, W [1 ]
机构：
[1] Bremer Inst Angew, BIAS, D-28359 Bremen, Germany
来源：
OPTICS AND LASERS IN ENGINEERING | 2001年 / 36卷 / 05期
关键词：
D O I：
10.1016/S0143-8166(01)00139-7
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：401 / 402
页数：2
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