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Capacitance-voltage profiling of quantum well structures
被引:25
|作者:
Tschirner, BM
MorierGenoud, F
Martin, D
Reinhart, FK
机构:
[1] Inst. de Micro-et Optoelectronique, Ecl. Polytech. Federale de Lausanne
关键词:
D O I:
10.1063/1.361466
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Capacitance-voltage (C-V) analysis of high quality MBE grown quantum well samples shows that carrier distributions are averaged over the scale of the Debye length. This averaging process results in strongly temperature dependent C-V-deduced doping distributions that can be very different from the actual ones. The doping distribution of the structure is obtained by fitting numerically simulated curves to the measured C-V curves and doping profiles, respectively. Although the calculations do not take quantum size effects into account they show good agreement with the measured data. (C) 1996 American Institute of Physics.
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页码:7005 / 7013
页数:9
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