Capacitance-voltage profiling of quantum well structures

被引:25
|
作者
Tschirner, BM
MorierGenoud, F
Martin, D
Reinhart, FK
机构
[1] Inst. de Micro-et Optoelectronique, Ecl. Polytech. Federale de Lausanne
关键词
D O I
10.1063/1.361466
中图分类号
O59 [应用物理学];
学科分类号
摘要
Capacitance-voltage (C-V) analysis of high quality MBE grown quantum well samples shows that carrier distributions are averaged over the scale of the Debye length. This averaging process results in strongly temperature dependent C-V-deduced doping distributions that can be very different from the actual ones. The doping distribution of the structure is obtained by fitting numerically simulated curves to the measured C-V curves and doping profiles, respectively. Although the calculations do not take quantum size effects into account they show good agreement with the measured data. (C) 1996 American Institute of Physics.
引用
收藏
页码:7005 / 7013
页数:9
相关论文
共 50 条
  • [11] THEORY AND EXPERIMENT OF CAPACITANCE-VOLTAGE PROFILING ON SEMICONDUCTORS WITH QUANTUM-CONFINEMENT
    SCHUBERT, EF
    KUO, JM
    KOPF, RF
    JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (06) : 521 - 531
  • [12] Influence of quantum-well structural parameters on capacitance-voltage characteristics
    Moon, CR
    Lim, H
    APPLIED PHYSICS LETTERS, 1999, 74 (20) : 2987 - 2989
  • [13] CAPACITANCE-VOLTAGE CHARACTERISTICS OF MULTIPLE-QUANTUM-WELL SEMICONDUCTOR HETEROSTRUCTURES
    ERSHOV, M
    RYZHII, V
    SAITO, K
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1995, 28 (10) : 2118 - 2122
  • [14] On the capacitance-voltage modeling of strained quantum-well MODFET's
    Manzoli, JE
    Romero, MA
    Hipolito, O
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1998, 34 (12) : 2314 - 2320
  • [16] Analysis of capacitance-voltage characteristics of Si1-xGex/Si quantum-well structures
    Wang, JB
    Lu, F
    Zhang, SK
    Zhang, B
    Gong, DW
    Sun, HH
    Wang, X
    PHYSICAL REVIEW B, 1996, 54 (11): : 7979 - 7986
  • [17] SPATIAL-RESOLUTION OF THE CAPACITANCE-VOLTAGE PROFILING TECHNIQUE ON SEMICONDUCTORS WITH QUANTUM CONFINEMENT
    SCHUBERT, EF
    KOPF, RF
    KUO, JM
    LUFTMAN, HS
    GARBINSKI, PA
    APPLIED PHYSICS LETTERS, 1990, 57 (05) : 497 - 499
  • [18] Specific Features of the Electrochemical Capacitance-Voltage Profiling of GaAs LED and pHEMT Structures with Quantum-Confined Regions
    Yakovlev, G. E.
    Dorokhin, M. V.
    Zubkov, V. I.
    Dudin, A. L.
    Zdoroveyshchev, A. V.
    Malysheva, E. I.
    Danilov, Yu. A.
    Zvonkov, B. N.
    Kudrin, A. V.
    SEMICONDUCTORS, 2018, 52 (08) : 1004 - 1011
  • [19] Estimation of AlGaAs/GaAs epitaxial structures thickness by means of electrochemical capacitance-voltage profiling
    Goncharov, V.E.
    Nikonov, A.V.
    Ilyasov, A.K.
    Arich, O.D.
    Applied Physics, 2019, 2019-January (03): : 61 - 66
  • [20] Technique for the Electrochemical Capacitance-Voltage Profiling of Heavily Doped Structures with a Sharp Doping Profile
    Frolov, D. S.
    Yakovlev, G. E.
    Zubkov, V. I.
    SEMICONDUCTORS, 2019, 53 (02) : 268 - 272