The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF

被引：7
|
作者：
Xue, Chaofan [1 ]
Meng, Xiangyu [1 ,2 ]
Wu, Yanqing [1 ]
Wang, Yong [1 ]
Wang, Liansheng [1 ]
Yang, Shumin [1 ]
Zhao, Jun [1 ]
Tai, Renzhong [1 ]
机构：
[1] Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Shanghai 201800, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
来源：
JOURNAL OF SYNCHROTRON RADIATION | 2018年 / 25卷
基金：
国家重点研发计划; 中国国家自然科学基金;
关键词：
synchrotron radiation; soft X-ray interference lithography beamline; spatial coherence; wave optics; mutual optical intensity; INTERFEROMETRIC LITHOGRAPHY; FABRICATION; PERFORMANCE; BAND;
D O I：
10.1107/S1600577518012833
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A new spatially coherent beamline has been designed and constructed at the Shanghai Synchrotron Radiation Facility. Here, the design of the beamline is introduced and the spatial coherence is analyzed throughout the whole process by wave optics. The simulation results show good spatial coherence at the endstation and have been proven by experiment results.
引用
收藏
页码：1869 / 1876
页数：8
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