Friction effects in atomic force microscopy of patterned octadecyltriethoxysilane-on-glass self-assembled monolayers

被引：37
|
作者：
Lee, BW [1 ]
Clark, NA [1 ]
机构：
[1] Univ Colorado, Dept Phys, Condensed Matter Lab, Boulder, CO 80309 USA
来源：
LANGMUIR | 1998年 / 14卷 / 19期
关键词：
D O I：
10.1021/la970217f
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
We present a quantitative study of the simultaneous effects of surface topography and friction in atomic force microscopic imaging of octadecyltriethoxysilane-on-glass self-assembled monolayers, patterned by illumination with ultraviolet radiation through a mask. The ultraviolet light leaves a similar to 1 nm deep topographic depression in the exposed areas, and produces larger surface-tip friction which can be the dominant contribution to the apparent topography.
引用
收藏
页码：5495 / 5501
页数：7
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