Analog and RF performance of doping-less tunnel FETs with Si0.55Ge0.45 source

被引:0
|
作者
Anand, Sunny [1 ]
Sarin, R. K. [1 ]
机构
[1] Dr BR Ambedkar Natl Inst Technol, Dept Elect & Commun Engn, Jalandhar, Punjab, India
关键词
Charge plasma; Doping less TFET (DLTFET); Band to band tunneling (BTBT); Si0.55Ge0.45-source DLTFET; Analog parameters; FIELD-EFFECT TRANSISTOR; LAYER; SIGE;
D O I
10.1007/s10825-016-0859-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports studies of a doping-less tunnel field-effect transistor (TFET) with a Si0.55Ge0.45 source structure aimed at improving the performance of charge-plasma-based doping-less TFETs. The proposed device achieves an improved ON-state current ( ION similar to 4.88 x 10(-5) A/mu m), an I-ON/I-OFF ratio of 6.91 x 10(12), an average subthreshold slope (AV-SS) of similar to 64.79mV/dec, and a point subthreshold slope (SS) of 14.95 mV/dec. This paper compares the analog and radio of frequency (RF) parameters of this device with those of a conventional doping-less TFET (DLTFET), including the transconductance (gm), transconductance-to-drain-current ratio (g(m)/I-D), output conductance (g(d)), intrinsic gain (A(V)), early voltage (VEA), total gate capacitance (C-gg), and unity-gain frequency (fT). Based on the simulated results, the Si0.55Ge0.45-source DLTFET is found to offer superior analog as well as RF performance.
引用
收藏
页码:850 / 856
页数:7
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