Role of carbon atoms in plasma-enhanced chemical vapor deposition for carbon nanotubes synthesis

被引:7
|
作者
Bratescu, M. A.
Suda, Y.
Sakai, Y.
Saito, N.
Takai, O.
机构
[1] N Factory Co Ltd, Showa Ku, Nagoya, Aichi 4660856, Japan
[2] Hokkaido Univ, Grad Sch Informat Sci & Technol, Sapporo, Hokkaido 0600814, Japan
[3] Nagoya Univ, Dept Mol Design & Engn, Nagoya, Aichi 4648605, Japan
[4] Nagoya Univ, EcoTopia Sci Inst, Nagoya, Aichi 4648603, Japan
基金
日本学术振兴会;
关键词
carbon; chemical vapor deposition (CVD); methane; nanostructure; optical spectroscopy; plasma processing and deposition; clusters; hydrocarbons;
D O I
10.1016/j.tsf.2006.03.022
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The role of carbon atoms in a dc plasma-enhanced chemical vapor deposition for carbon nanotubes (CNTs) synthesis was investigated. It was observed that at 1.33 kPa pressure of CH4 gas in plasma, a high value of the ratio between the intensities of the graphite peak (G peak) and the disorder peak (D peak) in the Raman spectrum corresponds to the maximum value of the excited C number density in the vicinity of the Si substrate. It was found that a CH4 gas pressure higher than 1.33 kPa leads to an increase of the relative density of the C-2, C-3 Molecules and the clusters, and to a decrease of the C excited atom number density in plasma. The presence of a high amount of sp(2)-graphite in the composition of CNTs observed in Raman spectrum was also confirmed by the measurement of the IR-active G peak at 1584 cm(-1) in the transmission spectrum. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:1314 / 1319
页数:6
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