Structural and Optical Properties of Al-Zn-Cu Thin Films Prepared by DC-Magnetron Sputtering at Different Sputtering Powers

Al-Zn-Cu thin films were deposited using DC-magnetron sputtering on glass substrates at room temperature in pure Ar gas environment. The influence of variation power sputtering from 30-120W on the structural and optical properties has been studied. The X-ray diffraction (XRD) patterns show amorphous structure for all films. The atomic force microscopy (AFM) images revealed a homogeneous Al-Zn-Cu dispersion within the layer in low power sputtering. The optical transmittance spectra showed that the optical transmittance in the visible was decreased with increased power sputtering. By increasing thickness of films, optical band gap in films decreased, and intensity of PL is increased.