共 50 条
- [34] Atomic topography change of SiO2/Si interfaces during thermal oxidation JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2002, 41 (5A): : L505 - L508
- [37] Limiting Si/SiO2 interface roughness resulting from thermal oxidation Journal of Applied Physics, 86 (03):
- [38] Atomic topography change of SiO2/Si interfaces during thermal oxidation Japanese Journal of Applied Physics, Part 2: Letters, 2002, 41 (05):
- [39] Effect of thermal oxidation on Si/SiO2 interface microroughness:: An atomic force microscopy (AFM) study PHYSICS AND CHEMISTRY OF SIO(2) AND THE SI-SIO(2) INTERFACE-3, 1996, 1996, 96 (01): : 338 - 347