Microstructure and magnetic properties of oxidized titanium nitride thin films in situ grown by pulsed laser deposition

被引:33
|
作者
Chen, S. C. [1 ]
Sung, K. Y. [1 ]
Tzeng, W. Y. [1 ]
Wu, K. H. [1 ]
Juang, J. Y. [1 ]
Uen, T. M. [1 ]
Luo, C. W. [1 ]
Lin, J-Y [2 ]
Kobayashi, T. [1 ]
Kuo, H. C. [3 ,4 ]
机构
[1] Natl Chiao Tung Univ, Dept Electrophys, Hsinchu 30050, Taiwan
[2] Natl Chiao Tung Univ, Inst Phys, Hsinchu, Taiwan
[3] Natl Chiao Tung Univ, Dept Photon, Hsinchu, Taiwan
[4] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu, Taiwan
关键词
X-RAY-ABSORPTION; ELECTRON-ENERGY-LOSS; TIO2; FILMS; TRANSPORT-PROPERTIES; OXIDATION; ANATASE; TIN; FERROMAGNETISM;
D O I
10.1088/0022-3727/46/7/075002
中图分类号
O59 [应用物理学];
学科分类号
摘要
Different oxidation states of titanium nitride thin films, including pure TiN(h 0 0), TiN1-xOx(h 0 0), Ti2O3(0 0 l) and pure anatase TiO2(0 0 l), were prepared by pulsed laser deposition with various oxygen pressures (P-O2) using a TiN target. Elaborative evolutions of the crystal and electronic structures of the obtained films were examined systematically by x-ray diffraction and x-ray absorption spectroscopy. We found that the Ti2O3(0 0 l) film, which was prepared at oxygen pressures P-O2 = 10(-4) Torr, exhibited the maximum room temperature ferromagnetism (RTFM) behaviour. The bound magnetic polaron model is used to clarify the origin of RTFM in these films.
引用
收藏
页数:7
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