Aligned-Crystalline Si Films on Glass

被引:0
|
作者
Findikoglu, Alp T. [1 ]
Ugurlu, Ozan [1 ]
Holesinger, Terry G. [1 ]
机构
[1] Los Alamos Natl Lab, MPA STC, Los Alamos, NM 87544 USA
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中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report structural and electronic properties of Aligned-Crystalline Si (ACSi) Films on glass substrates. These films show enhanced majority carrier mobilities and minority carrier lifetimes with increasing crystallinity, i.e., with improving alignment and connectivity of the grains. A 0.4-mu m-thick ACSi film with a total grain mosaic spread of 4.2 degrees showed Hall mobility of 47 cm(2)/V.s for a p-type doping concentration of 1.9x10(18) cm(-3). A prototype n+/p/p+-type diode fabricated using a 4.2-mu m-thick ACSi film showed minority carrier lifetime of similar to 3.5 mu s and estimated diffusion length of similar to 30 mu m in the p layer with a doping concentration of 5x10(16) cm(-3).
引用
收藏
页码:477 / 482
页数:6
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