Raman spectroscopic determination of electron concentration in n-type GaInAsSb

被引:5
|
作者
Maslar, J. E. [1 ]
Hurst, W. S. [1 ]
Wang, C. A. [2 ]
机构
[1] NIST, Chem Sci & Technol Lab, Gaithersburg, MD 20899 USA
[2] MIT, Lincoln Lab, Lexington, MA 02420 USA
关键词
conduction bands; dielectric function; electron density; Fermi level; gallium arsenide; Hall effect; III-V semiconductors; indium compounds; Raman spectra; CHEMICAL-VAPOR-DEPOSITION; LO-PHONON MODES; OPTICAL-PROPERTIES; LIGHT-SCATTERING; GASB; GAAS; CONDUCTION; GROWTH; PARAMETERS; DENSITY;
D O I
10.1063/1.3271351
中图分类号
O59 [应用物理学];
学科分类号
摘要
Phonon-plasmon coupled mode Raman spectra of n-type GaInAsSb were measured at room temperature as a function of electron concentration. A relatively simple spectral model for the electronic contribution to the dielectric function was evaluated to determine the electron concentration from the bulk coupled mode spectra. The electron concentration was determined from a Raman spectrum by minimizing the sum of the squared residuals between a measured and a simulated spectrum. The only two fitting parameters were the Fermi energy and a plasmon damping parameter. The electron concentrations determined from the fits to the Raman spectra were compared to the electron concentrations determined from single magnetic field Hall effect measurements that were corrected to account for carriers in two conduction band minima. Compared to the results obtained from the Hall effect measurements, the electron concentrations obtained using Raman spectroscopy were as much as approximate to 19% lower at low doping levels but not more than approximate to 1% higher at higher doping levels. At lower carrier concentrations, the deviations are attributed to limitations of the spectral model. At higher carrier concentrations, the two methods were in good agreement. However, given the known limitations of this relatively simple spectral model, this agreement may be fortuitous; i.e., elements of the spectral model that tend to increase the apparent carrier concentration may be offset by elements that decrease the apparent carrier concentration.
引用
收藏
页数:11
相关论文
共 50 条
  • [1] Spectroscopic determination of electron concentration in n-type GaSb
    Maslar, J. E.
    Hurst, W. S.
    Wang, C. A.
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (10)
  • [2] Ohmic contacts to n-type GaSb and n-type GaInAsSb
    Huang, RK
    Wang, CA
    Harris, CT
    Connors, MK
    Shiau, DA
    JOURNAL OF ELECTRONIC MATERIALS, 2004, 33 (11) : 1406 - 1410
  • [5] Raman spectroscopic determination of hole concentration in p-type GaSb
    Maslar, J. E.
    Hurst, W. S.
    Wang, C. A.
    JOURNAL OF APPLIED PHYSICS, 2008, 103 (01)
  • [6] Spectroscopic Determination of the Electrochemical Potentials of n-Type Doped Carbon Nanotubes
    Kim, Soo Min
    Kim, Ki Kang
    Dinh Loc Duong
    Hirana, Yasuhiko
    Tanaka, Yasuhiko
    Niidome, Yasuro
    Nakashima, Naotoshi
    Kong, Jing
    Lee, Young Hee
    JOURNAL OF PHYSICAL CHEMISTRY C, 2012, 116 (09): : 5444 - 5449
  • [7] NONDESTRUCTIVE DETERMINATION OF FREE-ELECTRON CONCENTRATION AND MOBILITY IN HG(1-X)CD(X)TE, N-TYPE INSB, AND N-TYPE GAAS
    CLARKE, FW
    JOURNAL OF APPLIED PHYSICS, 1994, 75 (09) : 4319 - 4326
  • [8] DETERMINATION OF FREE ELECTRON EFFECTIVE MASS OF N-TYPE SILICON
    HOWARTH, LE
    GILBERT, JF
    JOURNAL OF APPLIED PHYSICS, 1963, 34 (01) : 236 - &
  • [9] Raman Spectroscopic Study for the Determination of Monoethanolamine Concentration
    Wong, M. K.
    Bustam, M. A.
    Shariff, A. M.
    PROCESS AND ADVANCED MATERIALS ENGINEERING, 2014, 625 : 709 - 713
  • [10] Determination of carrier concentration by Fano interference of Raman scattering in heavily doped n-type 4H-SiC
    Mitani, Takeshi
    Nakashima, Shin-ichi
    Kojima, Kazutoshi
    Kato, Tomohisa
    Okumura, Hajime
    JOURNAL OF APPLIED PHYSICS, 2012, 112 (04)