Influence of hydrogen impurities on p-type resistivity in Mg-doped GaN films

被引:10
|
作者
Yang, Jing [1 ]
Zhao, Degang [1 ]
Jiang, Desheng [1 ]
Chen, Ping [1 ]
Zhu, Jianjun [1 ]
Liu, Zongshun [1 ]
Le, Lingcong [1 ]
He, Xiaoguang [1 ]
Li, Xiaojing [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
来源
基金
中国国家自然科学基金;
关键词
AMBIENT; DISSOCIATION; ACTIVATION;
D O I
10.1116/1.4904035
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effects of hydrogen impurities on p-type resistivity in Mg-doped GaN films were investigated. It was found that hydrogen impurities may have the dual role of passivating Mg-Ga acceptors and passivating donor defects. A decrease in p-type resistivity when O-2 is introduced during the postannealing process is attributed to the fact that annealing in an O-2-containing environment can enhance the dissociation of Mg-Ga-H complexes as well as the outdiffusion of H atoms from p-GaN films. However, low H concentrations are not necessarily beneficial in Mg-doped GaN films, as H atoms may also be bound at donor species and passivate them, leading to the positive effect of reduced compensation. (C) 2014 American Vacuum Society.
引用
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页数:4
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