Effects of TiO2 buffer layer on the photoelectrochemical properties of TiO2 Nanorods grown by modified chemical bath deposition method

被引:4
|
作者
Lee, Tae-hyun [1 ]
Ha, Jin-wook [1 ]
Ryu, Hyukhyun [1 ]
Lee, Won-Jae [2 ]
机构
[1] Inje Univ, Dept Nano Sci & Engn, High Safety Vehicle Core Technol Res Ctr, Gimhae 621749, South Korea
[2] Dong Eui Univ, Dept Mat & Components Engn, Busan 614714, South Korea
来源
关键词
photoelectrochemical; buffer layer; spin coating; nanorods; photocurrent density; semiconductors; chemical synsthesis; coating; crystal structure; scanning electron microscopy(SEM); CONVERSION EFFICIENCY; NANOWIRE ARRAYS; PHOTOACTIVITY; ELECTRODES; ANATASE; LENGTH; PHASE;
D O I
10.3365/KJMM.2015.53.8.591
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, we grew TiO2 nanorods on TiO2-film buffered FTO substrate using modified chemical bathdeposition (M-CBD). The TiO2 buffer layer was grown by spin coating method with different RPM (revolutions per minute) values and deposition cycles. We investigated the effects of the RPM values and the deposition cycles on the morphological, structural and photoelectrochemical properties of TiO2 nanorods. In this work, we have also found that the morphological and structural properties of TiO2 nanorods affected the photoelectrochemical properties of TiO2 nanorods. And the maximum photocurrent density of 0.34 mA/cm(2) at 0.6V (vs.SCE) was obtained from the buffer layer deposition process condition of 4,000 RPM and two-times buffer layer depositions.
引用
收藏
页码:591 / 599
页数:9
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