Theoretical and experimental studies of the current-voltage and capacitance-voltage of HEMT structures and field-effect transistors

被引:4
|
作者
Tarasova, E. A. [1 ]
Obolenskaya, E. S. [1 ]
Hananova, A. V. [1 ]
Obolensky, S. V. [1 ]
Zemliakov, V. E. [2 ]
Egorkin, V. I. [2 ]
Nezhenzev, A. V. [1 ]
Saharov, A. V. [3 ]
Zazul'nokov, A. F. [3 ]
Lundin, V. V. [3 ]
Zavarin, E. E. [3 ]
Medvedev, G. V. [4 ]
机构
[1] Lobachevsky State Univ Nizhny Novgorod NNSU, Nizhnii Novgorod 603950, Russia
[2] Natl Res Univ Elect Technol MIET, Moscow 124498, Zelenograd, Russia
[3] Russian Acad Sci, Ioffe Phys Tech Inst, St Petersburg 194021, Russia
[4] JSC RPE Salut, Nizhnii Novgorod, Russia
基金
俄罗斯基础研究基金会;
关键词
GAAS;
D O I
10.1134/S1063782616120216
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The sensitivity of classical n (+)/n (-) GaAs and AlGaN/GaN structures with a 2D electron gas (HEMT) and field-effect transistors based on these structures to gamma-neutron exposure is studied. The levels of their radiation hardness were determined. A method for experimental study of the structures on the basis of a differential analysis of their current-voltage characteristics is developed. This method makes it possible to determine the structure of the layers in which radiation-induced defects accumulate. A procedure taking into account changes in the plate area of the experimentally measured barrier-contact capacitance associated with the emergence of clusters of radiation-induced defects that form dielectric inclusions in the 2D-electron-gas layer is presented for the first time.
引用
收藏
页码:1574 / 1578
页数:5
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