Theoretical and experimental studies of the current-voltage and capacitance-voltage of HEMT structures and field-effect transistors

被引:4
|
作者
Tarasova, E. A. [1 ]
Obolenskaya, E. S. [1 ]
Hananova, A. V. [1 ]
Obolensky, S. V. [1 ]
Zemliakov, V. E. [2 ]
Egorkin, V. I. [2 ]
Nezhenzev, A. V. [1 ]
Saharov, A. V. [3 ]
Zazul'nokov, A. F. [3 ]
Lundin, V. V. [3 ]
Zavarin, E. E. [3 ]
Medvedev, G. V. [4 ]
机构
[1] Lobachevsky State Univ Nizhny Novgorod NNSU, Nizhnii Novgorod 603950, Russia
[2] Natl Res Univ Elect Technol MIET, Moscow 124498, Zelenograd, Russia
[3] Russian Acad Sci, Ioffe Phys Tech Inst, St Petersburg 194021, Russia
[4] JSC RPE Salut, Nizhnii Novgorod, Russia
基金
俄罗斯基础研究基金会;
关键词
GAAS;
D O I
10.1134/S1063782616120216
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The sensitivity of classical n (+)/n (-) GaAs and AlGaN/GaN structures with a 2D electron gas (HEMT) and field-effect transistors based on these structures to gamma-neutron exposure is studied. The levels of their radiation hardness were determined. A method for experimental study of the structures on the basis of a differential analysis of their current-voltage characteristics is developed. This method makes it possible to determine the structure of the layers in which radiation-induced defects accumulate. A procedure taking into account changes in the plate area of the experimentally measured barrier-contact capacitance associated with the emergence of clusters of radiation-induced defects that form dielectric inclusions in the 2D-electron-gas layer is presented for the first time.
引用
收藏
页码:1574 / 1578
页数:5
相关论文
共 50 条
  • [1] Theoretical and experimental studies of the current–voltage and capacitance–voltage of HEMT structures and field-effect transistors
    E. A. Tarasova
    E. S. Obolenskaya
    A. V. Hananova
    S. V. Obolensky
    V. E. Zemliakov
    V. I. Egorkin
    A. V. Nezhenzev
    A. V. Saharov
    A. F. Zazul’nokov
    V. V. Lundin
    E. E. Zavarin
    G. V. Medvedev
    Semiconductors, 2016, 50 : 1574 - 1578
  • [2] CURRENT-VOLTAGE AND CAPACITANCE-VOLTAGE CHARACTERISTICS OF HETEROSTRUCTURE INSULATED-GATE FIELD-EFFECT TRANSISTORS.
    Baek, Junho
    Shur, Michael
    Daniels, Robert R.
    Arch, David K.
    Abrokwah, Jonathon K.
    Tufte, Obert N.
    IEEE Transactions on Electron Devices, 1987, ED-34 (08) : 1650 - 1657
  • [3] Current-Voltage Model for Negative Capacitance Field-Effect Transistors
    Lee, Hyunjae
    Yoon, Youngki
    Shin, Changhwan
    IEEE ELECTRON DEVICE LETTERS, 2017, 38 (05) : 669 - 672
  • [4] CAPACITANCE-VOLTAGE AND CURRENT-VOLTAGE CHARACTERISTICS OF TUNNEL MOS STRUCTURES
    DUBEY, PK
    FILIKOV, VA
    SIMMONS, JG
    THIN SOLID FILMS, 1976, 33 (01) : 49 - 63
  • [5] Direct extraction of carrier mobility in graphene field-effect transistor using current-voltage and capacitance-voltage measurements
    Zhang, Zhiyong
    Xu, Huilong
    Zhong, Hua
    Peng, Lian-Mao
    APPLIED PHYSICS LETTERS, 2012, 101 (21)
  • [6] CURRENT-VOLTAGE AND CAPACITANCE-VOLTAGE CHARACTERISTICS OF REAL HETEROJUNCTIONS
    SHIK, AY
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1980, 14 (09): : 1028 - 1034
  • [7] CURRENT-VOLTAGE CHARACTERISTICS OF FIELD-EFFECT TRANSISTORS WITH SHORT CHANNELS
    HESS, K
    DORDA, G
    SAH, CT
    SOLID STATE COMMUNICATIONS, 1976, 19 (05) : 471 - 473
  • [8] CURRENT VOLTAGE AND CAPACITANCE VOLTAGE CHARACTERISTICS OF MODULATION-DOPED FIELD-EFFECT TRANSISTORS
    LEE, K
    SHUR, MS
    DRUMMOND, TJ
    MORKOC, H
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (03) : 207 - 212
  • [9] Capacitance-voltage and current-voltage characterization of AlxGa1-xAs-GaAs structures
    Passlack, M
    Hong, M
    Mannaerts, JP
    Chiu, TH
    Mendonca, CA
    Centanni, JC
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (12) : 7091 - 7098
  • [10] Interface characterization of nanocrystalline CdS/Au junction by current-voltage and capacitance-voltage studies
    Patel, BK
    Nanda, KK
    Sahu, SN
    JOURNAL OF APPLIED PHYSICS, 1999, 85 (07) : 3666 - 3670