Large area quasi-free standing monolayer graphene on 3C-SiC(111)

被引:3
|
作者
Starke, U. [1 ]
Coletti, C. [1 ,4 ]
Emtsev, K. V. [1 ]
Zakharov, A. A. [2 ]
Ouisse, T. [3 ]
Chaussende, D. [3 ]
机构
[1] Max Planck Inst Festkorperforsch, Heisenbergstr 1, D-70569 Stuttgart, Germany
[2] Lund Univ, Max Lab, SE-22100 Lund, Sweden
[3] Grenoble INP, Lab Mat & Genie Phys, CNRS, UMR 5628, F-38016 Grenoble, France
[4] NEST, Inst Italian Technol, Ctr Nanotechnol Innovat, I-56127 Pisa, Italy
关键词
Graphene; Intercalation; Quasi-free standing graphene; 3C-SiC; ARPES; AFM; LEEM; LEED; XPS;
D O I
10.4028/www.scientific.net/MSF.717-720.617
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Large scale, homogeneous quasi-free standing monolayer graphene is obtained on a (111) oriented cubic SiC bulk crystal. The free standing monolayer was prepared on the 3C-SiC(111) surface by hydrogen intercalation of a (6 root 3 x 6 root 3)R30 degrees-reconstnicted carbon monolayer, so-called zerolayer graphene, which had been grown in Ar atmosphere. The regular morphology of the surface, the complete chemical and structural decoupling of the graphene layer from the SiC substrate as well as the development of sharp monolayer pi-bands are demonstrated. On the resulting sample, homogeneous graphene monolayer domains extend over areas of hundreds of square-micrometers.
引用
收藏
页码:617 / +
页数:2
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