Large area quasi-free standing monolayer graphene on 3C-SiC(111)

被引:3
|
作者
Starke, U. [1 ]
Coletti, C. [1 ,4 ]
Emtsev, K. V. [1 ]
Zakharov, A. A. [2 ]
Ouisse, T. [3 ]
Chaussende, D. [3 ]
机构
[1] Max Planck Inst Festkorperforsch, Heisenbergstr 1, D-70569 Stuttgart, Germany
[2] Lund Univ, Max Lab, SE-22100 Lund, Sweden
[3] Grenoble INP, Lab Mat & Genie Phys, CNRS, UMR 5628, F-38016 Grenoble, France
[4] NEST, Inst Italian Technol, Ctr Nanotechnol Innovat, I-56127 Pisa, Italy
关键词
Graphene; Intercalation; Quasi-free standing graphene; 3C-SiC; ARPES; AFM; LEEM; LEED; XPS;
D O I
10.4028/www.scientific.net/MSF.717-720.617
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Large scale, homogeneous quasi-free standing monolayer graphene is obtained on a (111) oriented cubic SiC bulk crystal. The free standing monolayer was prepared on the 3C-SiC(111) surface by hydrogen intercalation of a (6 root 3 x 6 root 3)R30 degrees-reconstnicted carbon monolayer, so-called zerolayer graphene, which had been grown in Ar atmosphere. The regular morphology of the surface, the complete chemical and structural decoupling of the graphene layer from the SiC substrate as well as the development of sharp monolayer pi-bands are demonstrated. On the resulting sample, homogeneous graphene monolayer domains extend over areas of hundreds of square-micrometers.
引用
收藏
页码:617 / +
页数:2
相关论文
共 50 条
  • [31] Large-area microfocal spectroscopic ellipsometry mapping of thickness and electronic properties of epitaxial graphene on Si- and C-face of 3C-SiC(111)
    Darakchieva, V.
    Boosalis, A.
    Zakharov, A. A.
    Hofmann, T.
    Schubert, M.
    Tiwald, T. E.
    Iakimov, T.
    Vasiliauskas, R.
    Yakimova, R.
    APPLIED PHYSICS LETTERS, 2013, 102 (21)
  • [32] Influence of twin boundary orientation on magnetoresistivity effect in free standing 3C-SiC
    Vasiliauskas, R.
    Mekys, A.
    Malinovskis, P.
    Syvajarvi, M.
    Storasta, J.
    Yakimova, R.
    MATERIALS LETTERS, 2012, 74 : 203 - 205
  • [33] Effect of intercalated hydrogen on the electron state of quasi-free graphene on a SiC substrate
    Davydov, S. Yu.
    SEMICONDUCTORS, 2017, 51 (05) : 640 - 644
  • [34] Effect of intercalated hydrogen on the electron state of quasi-free graphene on a SiC substrate
    S. Yu. Davydov
    Semiconductors, 2017, 51 : 640 - 644
  • [35] Effect of substrate polishing on the growth of graphene on 3C-SiC(111)/Si(111) by high temperature annealing
    Gupta, B.
    Di Bernardo, I.
    Mondelli, P.
    Della Pia, A.
    Betti, M. G.
    Iacopi, F.
    Mariani, C.
    Motta, N.
    NANOTECHNOLOGY, 2016, 27 (18)
  • [36] Graphene Formation on a 3C-SiC(111) Thin Film Grown on Si(110) Substrate
    Suemitsu, Maki
    Miyamoto, Yu
    Handa, Hiroyuki
    Konno, Atsushi
    E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY, 2009, 7 : 311 - 313
  • [37] TEM and LTPL Investigations of 3C-SiC Layers Grown by LPE on (100) and (111) 3C-SiC Seeds
    Marinova, M.
    Zoulis, G.
    Robert, T.
    Mercier, F.
    Mantzari, A.
    Galben, I.
    Kim-Hak, O.
    Lorenzzi, J.
    Juillaguet, S.
    Chaussende, D.
    Ferro, G.
    Camassel, J.
    Polychroniadis, E. K.
    SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, 2010, 645-648 : 383 - +
  • [38] Epitaxial Graphene on Si(111) Substrate Grown by Annealing 3C-SiC/Carbonized Silicon
    Aryal, Hare Ram
    Fujita, Kazuhisa
    Banno, Kazuya
    Egawa, Takashi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (01)
  • [39] Free Standing Stress Amplification Structure for Ultrasensitive 3C-SiC/Si Pressure Sensor
    Tong, Braiden
    Hong-Quan Nguyen
    Tuan-Hung Nguyen
    Tuan-Khoa Nguyen
    Viet Thanh Nguyen
    Toan Dinh
    Trung-Hieu Vu
    Van Thanh Dau
    Dzung Viet Dao
    2022 IEEE SENSORS, 2022,
  • [40] Raman stress characterization of hetero-epitaxial 3C-SiC free standing structures
    Piluso, N.
    Camarda, M.
    Anzalone, R.
    Severino, A.
    La Magna, A.
    D'Arrigo, G.
    La Via, F.
    SILICON CARBIDE AND RELATED MATERIALS 2010, 2011, 679-680 : 141 - 144