Highly Flexible Resistive Switching Memory Based on the Electronic Switching Mechanism in the Al/TiO2/Al/Polyimide Structure

被引:69
|
作者
Zhao, Jinshi [1 ]
Zhang, Ming [1 ]
Wan, Shangfei [1 ]
Yang, Zhengchun [1 ]
Hwang, Cheol Seong [2 ,3 ]
机构
[1] Tianjin Univ Technol, Tianjin Key Lab Film Elect & Commun Devices, Sch Elect & Elect Engn, Tianjin 300384, Peoples R China
[2] Seoul Natl Univ, Dept Mat Sci & Engn, 599 Gwanak Ro, Seoul 151744, South Korea
[3] Seoul Natl Univ, Interuniv Semicond Res Ctr, 599 Gwanak Ro, Seoul 151744, South Korea
基金
中国国家自然科学基金;
关键词
electronic resistive switching; highly flexible memory; mechanical endurance; titanium dioxide; electron trapping/detrapping; high performance; NONVOLATILE MEMORY; OXYGEN VACANCIES; GRAPHENE OXIDE; THIN-FILMS; RESISTANCE; DEVICE; FABRICATION; TRANSISTORS; DEPOSITION; SUBSTRATE;
D O I
10.1021/acsami.7b16214
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A highly flexible resistive switching (RS) was fabricated in the Al/TiO2/Al/polyimide using a simple and cost-effective method. An electronic-resistive-switching-based flexible memory with high performance that can withstand a bending strain of up to 3.6% was obtained. The RS properties showed no obvious degradation even after the bending tests that were conducted up to 10 000 times, and over 4000 writing/erasing cycles were confirmed at the maximally bent state. The superior electrical properties against the mechanical stress of the device can be ascribed to the electronic RS mechanism related to electron trapping/detrapping, which can prevent the inevitable degradation in the case of the RS related with the ionic defects.
引用
收藏
页码:1828 / 1835
页数:8
相关论文
共 50 条
  • [41] Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory
    Zhang, Rulin
    Huang, Hong
    Xia, Qing
    Ye, Cong
    Wei, Xiaodi
    Wang, Jinzhao
    Zhang, Li
    Zhu, Li Qiang
    ADVANCED ELECTRONIC MATERIALS, 2019, 5 (05):
  • [42] Preparation and Resistive Switching Mechanism of Rutile TiO2 Nanowire Memristor
    Yu, Zhiqiang
    Xu, Jiamin
    Han, Xu
    Chen, Cheng
    Qu, Xinru
    Tang, Jin
    Sun, Zijun
    Xu, Zhimou
    Cailiao Daobao/Materials Reports, 2024, 38 (13):
  • [43] Unraveling the Role of Polydopamines in Resistive Switching in Al/Polydopamine/Al Structure for Organic Resistive Random-Access Memory
    Yun, Jonghyeon
    Kim, Daewon
    POLYMERS, 2022, 14 (15)
  • [44] Resistive Switching Behavior of Al/Al2O3/ZrO2/Al Structural Device for Flexible Nonvolatile Memory Application
    Lin, Chun-Chieh
    Su, Che-Ting
    Chang, Chien-Le
    Wu, Hsiao-Yu
    IEEE TRANSACTIONS ON MAGNETICS, 2014, 50 (07)
  • [45] Bipolar Resistive Switching Characteristics in Flexible Pt/MZT/Al Memory and Ni/NbO2/Ni Selector Structure
    Lee, Ke-Jing
    Chang, Yu-Chi
    Lee, Cheng-Jung
    Wang, Li-Wen
    Wang, Yeong-Her
    IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2018, 6 (01): : 518 - 524
  • [46] ZrN-Based Flexible Resistive Switching Memory
    Kumar, Dayanand
    Chand, Umesh
    Siang, Lew Wen
    Tseng, Tseung-Yuen
    IEEE ELECTRON DEVICE LETTERS, 2020, 41 (05) : 705 - 708
  • [47] Tuning the analog and digital resistive switching properties of TiO2 by nanocompositing Al-doped ZnO
    Patil, Akhilesh P.
    Nirmal, Kiran A.
    Mali, Sawanta S.
    Hong, Chang Kook
    Kim, Tae Geun
    Patil, Pramod S.
    Dongale, Tukaram D.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2020, 115 (115)
  • [48] Localized switching mechanism in resistive switching of atomic-layer-deposited TiO2 thin films
    Kim, Kyung Min
    Choi, Byung Joon
    Hwang, Cheol Seong
    APPLIED PHYSICS LETTERS, 2007, 90 (24)
  • [49] Tuning the analog and digital resistive switching properties of TiO2 by nanocompositing Al-doped ZnO
    Patil, Akhilesh P.
    Nirmal, Kiran A.
    Mali, Sawanta S.
    Hong, Chang Kook
    Kim, Tae Geun
    Patil, Pramod S.
    Dongale, Tukaram D.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2020, 115
  • [50] Effect of AlN layer on the resistive switching properties of TiO2 based ReRAM memory devices
    Rathore, Bhawani Pratap Singh
    Prakash, Ravi
    Kaur, Davinder
    CURRENT APPLIED PHYSICS, 2018, 18 (01) : 102 - 106