共 50 条
- [43] Effect of discharge current and deposition temperature on roughness and density of NbC films fabricated by Ion beam sputtering technique SOLID STATE PHYSICS: PROCEEDINGS OF THE 58TH DAE SOLID STATE PHYSICS SYMPOSIUM 2013, PTS A & B, 2014, 1591 : 951 - 953
- [44] Effect of discharge current and deposition temperature on roughness and density of NbC films fabricated by ion beam sputtering technique (1) X-ray Optics Section, Indus Synchrotron Utilization Division, Raja Ramanna Center for Advanced Technology, Indore-452013, India, 1600, Board of Research in Nuclear Sciences; Department of Atomic Energy; Government of India (American Institute of Physics Inc.):
- [45] Deposition of amorphous M1-Ni films using ion-beam sputtering and their electrocatalytic properties SURFACE & COATINGS TECHNOLOGY, 1997, 91 (03): : 225 - 229
- [48] STRUCTURAL INVESTIGATIONS IN THERMALLY TREATED URANIUM-DIOXIDE THIN-FILMS DEPOSITED BY ION-BEAM SPUTTERING TECHNIQUE REVUE ROUMAINE DE PHYSIQUE, 1973, 18 (01): : 3 - &