Giant magnetoresistance and microstructures in CoAg granular films fabricated using ion-beam co-sputtering technique

被引:30
|
作者
Sang, H
Xu, N
Du, JH
Ni, G
Zhang, SY
Du, YW
机构
[1] NANJING UNIV, INST SOLID STATE PHYS, NANJING 210093, PEOPLES R CHINA
[2] CTR ADV STUDIES SCI & TECHNOL MICROSTRUCT, NANJING 210093, PEOPLES R CHINA
来源
PHYSICAL REVIEW B | 1996年 / 53卷 / 22期
关键词
D O I
10.1103/PhysRevB.53.15023
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The correlation between the GMR effect and the microstructures in ion-beam co-sputtered CoAg granular films was systematically studied. The highest magnetoresistance was observed in Co22Ag78 samples. It is sensitive to the annealing treatment and to;the size of the cobalt granules. The microstructures of the sample were studied by a variety of structural techniques. HREM provides a clear two-dimensional image of as-deposited Co22Ag78 samples. Real-time observation of TEM together with FMR indicates that the shapes and sizes of cobalt granules evolve primarily in plane during the annealing process.
引用
收藏
页码:15023 / 15026
页数:4
相关论文
共 50 条
  • [41] Low temperature growth of Co2MnSi films on diamond semiconductors by ion-beam assisted sputtering
    Nishiwaki, M.
    Ueda, K.
    Asano, H.
    JOURNAL OF APPLIED PHYSICS, 2015, 117 (17)
  • [42] STRUCTURAL AND MAGNETIC-PROPERTIES OF FE-CO THIN-FILMS ELABORATED BY ION-BEAM SPUTTERING
    PAIN, P
    EYMERY, JP
    CAHOREAU, M
    DENANOT, MF
    DINHUT, JF
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1994, 133 (1-3) : 493 - 496
  • [43] Effect of discharge current and deposition temperature on roughness and density of NbC films fabricated by Ion beam sputtering technique
    Dhawan, Rajnish
    Rai, Sanjay
    Lodha, G. S.
    SOLID STATE PHYSICS: PROCEEDINGS OF THE 58TH DAE SOLID STATE PHYSICS SYMPOSIUM 2013, PTS A & B, 2014, 1591 : 951 - 953
  • [44] Effect of discharge current and deposition temperature on roughness and density of NbC films fabricated by ion beam sputtering technique
    20142717882320
    (1) X-ray Optics Section, Indus Synchrotron Utilization Division, Raja Ramanna Center for Advanced Technology, Indore-452013, India, 1600, Board of Research in Nuclear Sciences; Department of Atomic Energy; Government of India (American Institute of Physics Inc.):
  • [45] Deposition of amorphous M1-Ni films using ion-beam sputtering and their electrocatalytic properties
    Hu, WK
    Zhang, YS
    Song, DY
    Wang, GS
    SURFACE & COATINGS TECHNOLOGY, 1997, 91 (03): : 225 - 229
  • [46] MAGNETIC-PROPERTIES OF PR-CO AND ND-CO THIN-FILMS DEPOSITED BY ION-BEAM SPUTTERING
    TERADA, N
    NAOE, M
    HOSHI, Y
    JOURNAL OF APPLIED PHYSICS, 1985, 57 (08) : 4170 - 4172
  • [47] DEPOSITION OF AMORPHOUS CO-TA AND CO-ZR THIN-FILMS BY MEANS OF DOUBLE ION-BEAM SPUTTERING
    NAOE, M
    TERADA, N
    HOSHI, Y
    YAMANAKA, S
    IEEE TRANSACTIONS ON MAGNETICS, 1984, 20 (05) : 1311 - 1313
  • [48] STRUCTURAL INVESTIGATIONS IN THERMALLY TREATED URANIUM-DIOXIDE THIN-FILMS DEPOSITED BY ION-BEAM SPUTTERING TECHNIQUE
    VASILIU, F
    GLODEANU, F
    REVUE ROUMAINE DE PHYSIQUE, 1973, 18 (01): : 3 - &
  • [49] YBA2CU3O7-DELTA FILMS DEPOSITED BY A NOVEL ION-BEAM SPUTTERING TECHNIQUE
    KINGON, AI
    AUCIELLO, O
    AMEEN, MS
    ROU, SH
    KRAUSS, AR
    APPLIED PHYSICS LETTERS, 1989, 55 (03) : 301 - 303
  • [50] NiTi thin films prepared by biased target ion beam deposition co-sputtering from elemental Ni and Ti targets
    Hou, Huilong
    Hamilton, Reginald F.
    Horn, Mark W.
    Jin, Yao
    THIN SOLID FILMS, 2014, 570 : 1 - 6