Effect of discharge current and deposition temperature on roughness and density of NbC films fabricated by ion beam sputtering technique

被引：0
|
作者：
20142717882320
机构：
来源：
(1) X-ray Optics Section, Indus Synchrotron Utilization Division, Raja Ramanna Center for Advanced Technology, Indore-452013, India | 1600年 / Board of Research in Nuclear Sciences; Department of Atomic Energy; Government of India卷 / American Institute of Physics Inc.期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
108168
引用
收藏
相关论文
共 50 条
  • [1] Effect of discharge current and deposition temperature on roughness and density of NbC films fabricated by Ion beam sputtering technique
    Dhawan, Rajnish
    Rai, Sanjay
    Lodha, G. S.
    SOLID STATE PHYSICS: PROCEEDINGS OF THE 58TH DAE SOLID STATE PHYSICS SYMPOSIUM 2013, PTS A & B, 2014, 1591 : 951 - 953
  • [2] Optical Properties of ZrO2 films fabricated by ion beam sputtering deposition at low temperature
    Atuchin, V. V.
    Aliev, V. Sh.
    Kruchinin, V. N.
    Ramana, C. V.
    IFOST: 2007 INTERNATIONAL FORUM ON STRATEGIC TECHNOLOGY, 2007, : 529 - +
  • [3] Deposition of silicon oxynitride films by ion beam sputtering at room temperature
    Chen, Huang-Lu
    Hsu, Jin-Cherng
    OPTICAL REVIEW, 2009, 16 (02) : 226 - 228
  • [4] Deposition of silicon oxynitride films by ion beam sputtering at room temperature
    Huang-Lu Chen
    Jin-Cherng Hsu
    Optical Review, 2009, 16 : 226 - 228
  • [5] Low temperature deposition of ITO thin films by ion beam sputtering
    Kim, D
    Han, Y
    Cho, JS
    Koh, SK
    THIN SOLID FILMS, 2000, 377 : 81 - 86
  • [6] Zinc Oxide Thin Films Fabricated with Direct Current Magnetron Sputtering Deposition Technique
    Hoon, Jian-Wei
    Chan, Kah-Yoong
    Krishnasamy, Jegenathan
    Tou, Teck-Yong
    MALAYSIA ANNUAL PHYSICS CONFERENCE 2010 (PERFIK-2010), 2011, 1328 : 235 - 237
  • [7] Deposition of PTFE thin films by ion beam sputtering and a study of the ion bombardment effect
    Tsinghua Univ, Beijing, China
    Nucl Instrum Methods Phys Res Sect B, 1-4 (512-516):
  • [8] Deposition of PTFE thin films by ion beam sputtering and a study of the ion bombardment effect
    He, JL
    Li, WZ
    Wang, LD
    Wang, J
    Li, HD
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 135 (1-4): : 512 - 516
  • [9] DEPOSITION OF THIN-FILMS OF PZT BY A FOCUSED ION-BEAM SPUTTERING TECHNIQUE
    CASTELLANO, RN
    FERROELECTRICS, 1980, 28 (1-4) : 387 - 390
  • [10] Effect of different ion beam energy on properties of amorphous carbon film fabricated by ion beam sputtering deposition (IBSD)
    Bai, Lichun
    Zhang, Guangan
    Wu, Zhiguo
    Wang, Jun
    Yan, Pengxun
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2011, 269 (17): : 1871 - 1877
12345