Effect of discharge current and deposition temperature on roughness and density of NbC films fabricated by ion beam sputtering technique

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20142717882320
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(1) X-ray Optics Section, Indus Synchrotron Utilization Division, Raja Ramanna Center for Advanced Technology, Indore-452013, India | 1600年 / Board of Research in Nuclear Sciences; Department of Atomic Energy; Government of India卷 / American Institute of Physics Inc.期
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