Optical characterisation of CNx thin films deposited by reactive pulsed laser ablation

被引：24
|
作者：
Zocco, A
Perrone, A
Luches, A
Rella, R
Klini, A
Zergioti, I
Fotakis, C
机构：
[1] Univ Lecce, Dipartimento Fis, I-73100 Lecce, Italy
[2] Ist Nazl Fis Mat, I-73100 Lecce, Italy
[3] CNR, IME, Ist Studio Nuovi Mat Elettron, I-73100 Lecce, Italy
[4] Univ Crete, Dept Phys, Heraklion 71110, Crete, Greece
[5] Fdn Res & Technol Hellas, Laser & Applicat Div, Heraklion 71110, Crete, Greece
来源：
THIN SOLID FILMS | 1999年 / 349卷 / 1-2期
关键词：
nitrides; optical properties; laser ablation; infrared spectroscopy;
D O I：
10.1016/S0040-6090(99)00221-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Optical absorption measurements on CNx thin films produced by reactive pulsed laser ablation (RPLA) at different pressures of nitrogen in the growth chamber were performed. The influence of growth regime on optical properties (n,k) of the CNx films has been examined with LR and UV-VIS spectroscopy. The dependence of the absorption coefficient a on the photon energy (h) over bar omega at the edge of the absorption band is well described by the relation alpha (h) over bar omega = B((h) over bar omega - E-opt)(2) indicating the presence of allowed indirect transitions in the 0.8-3.0 eV photon energy range. Furthermore, we observed a decrease in the optical gap values with increasing N concentration in the deposited films. Fourier transform infrared (FTIR) spectra a err also employed to analyse the chemical bonding state between the different species present in the films. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：100 / 104
页数：5
相关论文
共 50 条
  • [31] Nanostructured silver thin films deposited by pulsed laser ablation
    Fazio, B.
    Trusso, S.
    Fazio, E.
    Neri, F.
    Ossi, P. M.
    Santo, N.
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2008, 163 (08): : 673 - 683
  • [32] Characterization of Hastelloy thin films deposited by pulsed laser ablation
    Vignolo, MF
    Avram, I
    Duhalde, S
    Morales, C
    Pérez, T
    Cultrera, L
    Perrone, A
    Zocco, A
    APPLIED SURFACE SCIENCE, 2002, 197 : 343 - 347
  • [33] Zirconium carbide thin films deposited by pulsed laser ablation
    D'Alessio, L
    Santagata, A
    Teghil, R
    Zaccagnino, M
    Zaccardo, I
    Marotta, V
    Ferro, D
    De Maria, G
    APPLIED SURFACE SCIENCE, 2000, 168 (1-4) : 284 - 287
  • [34] Effects of the plasma expansion dynamics and of the laser fluence on CNx thin films deposited by laser ablation
    Barreca, F.
    Barletta, E.
    Spadaro, D.
    Spadaro, S.
    Curro, G.
    Trusso, S.
    Neri, F.
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2010, 165 (6-10): : 809 - 814
  • [35] Optical switching of vanadium dioxide thin films deposited by reactive pulsed laser deposition
    Soltani, M
    Chaker, M
    Haddad, E
    Kruzelecky, RV
    Nikanpour, D
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 22 (03): : 859 - 864
  • [36] Carbon nitride films deposited by reactive sputtering and pulsed laser ablation
    Yasui, T
    Kotani, T
    Fujiuchi, K
    Tahara, H
    Yoshikawa, T
    THIN SOLID FILMS, 2004, 457 (01) : 133 - 138
  • [37] Optical studies of carbon nitride thin films deposited by reactive pulsed laser ablation of a graphite target in low pressure ammonia
    Mihailescu, IN
    Gyorgy, E
    Alexandrescu, R
    Luches, A
    Perrone, A
    Ghica, C
    Werckmann, J
    Cojocaru, I
    Chumash, V
    THIN SOLID FILMS, 1998, 323 (1-2) : 72 - 78
  • [38] REACTIVE PULSED-LASER DEPOSITION OF CNX FILMS
    ZHAO, XA
    ONG, CW
    TSANG, YC
    WONG, YW
    CHAN, PW
    CHOY, CL
    APPLIED PHYSICS LETTERS, 1995, 66 (20) : 2652 - 2654
  • [39] Optical studies of carbon nitride thin films deposited by reactive pulsed laser ablation of a graphite target in low pressure ammonia
    Inst of Atomic Physics, Bucharest, Romania
    Thin Solid Films, 1-2 (72-78):
  • [40] Deposition of CN thin films by reactive pulsed laser ablation
    Perrone, A
    FIFTH CONFERENCE ON OPTICS (ROMOPTO '97), PTS 1 AND 2, 1998, 3405 : 130 - 142
12345