Nanostructured silver thin films deposited by pulsed laser ablation

被引：7

作者：

Fazio, B. ^{[1
]}

Trusso, S. ^{[1
]}

Fazio, E. ^{[2
]}

Neri, F. ^{[2
]}

Ossi, P. M. ^{[3
]}

Santo, N. ^{[4
]}

机构：

[1] CNR, Ist & Proc Chimicofis Sez Messina, Messina, Italy

[2] Univ Messina, Dipartimento Fis Mat & Tecnol Fis Avanzate, Messina, Italy

[3] Politecn Milan, NEMAS, Ctr Nano Engn Mat & Surfaces, Dip Chim Mat Ingn Chim G Natta, I-20133 Milan, Italy

[4] Politecn Milan, CIMA, I-20133 Milan, Italy

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 2008年 / 163卷 / 08期

关键词：

pulsed laser deposition; electron microscopy; plasma-laser;

D O I：

10.1080/10420150701781001

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

Nanostructured thin films were deposited by excimer laser ablation of silver targets in controlled atmospheres of He and Ar. The film structural properties were investigated by means of scanning electron microscope and transmission electron microscope imaging. The film growth mechanism was identified as the result of coalescence of nanometric clusters formed during plume flight. Cluster formation involves plume confinement as a consequence of the increased collisional rate among plasma species. Fast photography imaging of the laser-generated silver plasma allowed to identify plasma confinement, shock wave formation and plasma stopping.

引用

页码：673 / 683

页数：11

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