Device scaling physics and channel velocities in AlGaN/GaN HFETs: Velocities and effective gate length

被引:49
|
作者
Wu, YR [1 ]
Singh, M
Singh, J
机构
[1] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
[2] MIT, Elect Res Lab, Cambridge, MA 02139 USA
关键词
AlGaN; effective gate length; GaN; heterojunction field-effect transistors (HFETs); InGaAs; InP; recessed gate; scaling; III-V nitrides;
D O I
10.1109/TED.2006.870571
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper addresses scaling issues in AlGaN/GaN heterojunction field-effect transistors (HFETs) using ensemble Monte Carlo techniques. For gate lengths below 0.25 mu m, f(T) values are known not to scale linearly with the inverse gate length. The authors' simulations show this to be due to an increasing difference between the lithographic gate length and the effective gate length as the devices shrink. The results for AlGaN/GaN are compared with In0.52Al0.48-In0.53Ga0.47As-InP devices, and the authors found that the limiting role of velocity overshoot and depletion region spread causes the GaN HFETs to have a peak fT of similar to 220 GHz compared to similar to 500 GHz for InGaAs devices.
引用
收藏
页码:588 / 593
页数:6
相关论文
共 50 条
  • [41] High-voltage AlGaN/GaN HFETs by using graded gate field plates
    Deguchi, T.
    Kamada, A.
    Yamashita, M.
    Tomita, H.
    Arai, M.
    Yamasaki, K.
    Egawa, T.
    ELECTRONICS LETTERS, 2012, 48 (02) : 109 - U1217
  • [42] Reverse Gate-Current of AlGaN/GaN HFETs: Evidence of Leakage at Mesa Sidewalls
    Mojaver, Hassan Rahbardar
    Valizadeh, Pouya
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 63 (04) : 1444 - 1449
  • [43] Analytical Modeling of Current Collapse in AlGaN/GaN HFETs According to the Virtual Gate Concept
    Moradi, Maziar
    Valizadeh, Pouya
    IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2010, 10 (02) : 287 - 294
  • [44] Influence of InGaN channel thickness on electrical characteristics of AlGaN/InGaN/GaN HFETs
    Wang, R. -L.
    Su, Y. -K.
    Chen, K. -Y.
    ELECTRONICS LETTERS, 2006, 42 (12) : 718 - 719
  • [45] Mobility enhancement in recessed-gate AlGaN/GaN MOS-HFETs using an AION gate insulator
    Hosoi, Takuji
    Watanabe, Kenta
    Nozaki, Mikito
    Yamada, Takahiro
    Shimura, Takayoshi
    Watanabe, Heiji
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2019, 58 (SC)
  • [46] Transport and noise features in AlGaN/GaN field, effect transistor with nanometer-scaling gate length
    Vitusevich, S. A.
    Petrychuk, M. V.
    Danylyuk, S. V.
    Kurakin, A. M.
    Klein, N.
    Lueth, H.
    Belyaev, A. E.
    INTERNATIONAL JOURNAL OF NANOSCIENCE, VOL 4, NOS 5 AND 6, 2005, 4 (5-6): : 1001 - 1006
  • [47] The influence of gate length on the electron injection of velocity in an AlGaN/AlN/GaN DeD•DeD¢ channel
    Mikhailovich, S. V.
    Galiev, R. R.
    Zuev, A. V.
    Pavlov, A. Yu.
    Ponomarev, D. S.
    Khabibullin, R. A.
    TECHNICAL PHYSICS LETTERS, 2017, 43 (08) : 733 - 735
  • [48] Effective gate length determination of AlGaN/GaN HEMTs from direct measurements of thermal signatures
    Sahu, Arpit
    Parvez, Bazila
    Patil, Mahalaxmi
    Basak, Subhajit
    Sahu, Jyoti
    Upadhyay, Bhanu B.
    Ganguly, Swaroop
    Saha, Dipankar
    APPLIED PHYSICS LETTERS, 2024, 124 (12)
  • [49] Charge Injection in Normally-Off p-GaN Gate AlGaN/GaN-on-Si HFETs
    Savadi, Luca
    Iannaccone, Giuseppe
    Sicre, Sebastien
    Lavanza, Simone
    Fiori, Gianluca
    Haberlen, Oliver
    Curatola, Gilberto
    2018 48TH EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE (ESSDERC), 2018, : 18 - 21
  • [50] 0.15 μm gate-length AlGaN/GaN HEMTs with varying gate recess length
    Kuliev, A
    Kumar, V
    Schwindt, R
    Selvanathan, D
    Dabiran, AM
    Chow, P
    Adesida, I
    SOLID-STATE ELECTRONICS, 2003, 47 (01) : 117 - 122