Correlated to random transition of ionized impurity distribution in n-type Ge : (As, Ga)

被引:0
|
作者
Kato, J
Itoh, KM
Haller, EE
机构
[1] Keio Univ, Dept Appl Phys & Physicoinformat, Yokohama, Kanagawa 2238522, Japan
[2] Univ Calif Berkeley, Berkeley, CA 94720 USA
[3] Lawrence Berkeley Natl Labs, Berkeley, CA 94720 USA
关键词
impurity distribution; compensated semiconductor; impurity absorption;
D O I
10.1016/S0921-4526(01)00751-7
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We discuss the broadening of ground-state to bounded excited-state transitions of shallow donors in strongly compensated n-type Ge: (As,Ga) in the presence of electric fields and their gradients, arising from randomly distributed ionized impurities. Quantitative comparison of the experimentally obtained linewidths with Monte Carlo simulation results makes possible, a unique determination of the ionized impurity distribution in the samples. We present clear evidence for the random-to-correlated transition of the ionized impurity distribution as a function of the ionized impurity concentration and of temperature. (C) 2001 Published by Elsevier Science B.V.
引用
收藏
页码:521 / 524
页数:4
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