On Characterizing Near-Threshold SRAM Failures in FinFET Technology

被引:18
|
作者
Ganapathy, Shrikanth [1 ]
Kalamatianos, John [1 ]
Kasprak, Keith [2 ]
Raasch, Steven [1 ]
机构
[1] Adv Micro Devices Inc, AMD Res, Sunnyvale, CA 94088 USA
[2] Adv Micro Devices Inc, Cores Grp, Sunnyvale, CA 94088 USA
关键词
D O I
10.1145/3061639.3062292
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Adoption of near-threshold voltage (NTV) operation in SRAM-based memories has been limited by reduced robustness resulting from marginal transistor operation that results in bit failures. Using silicon measurements from a large sample of 14nm FinFET test chips, we show that our cells operate at frequencies of up to 1GHz with a minimum 15% voltage guardband, below which the cells begin to fail. We find that when operated at 32.5% below nominal voltage, >95% of the lines experience fewer than 2 failures, which can be corrected with SECDED ECC. Our results indicate that for frequencies of up to 1GHz, NTV can help maximize power savings potential while requiring minimal protection.
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页数:6
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