Optical investigations of the microstructure of carbon nitride films deposited by magnetron sputtering

被引：4
|
作者：
Lejeune, M
Durand-Drouhin, O
Ballutaud, D
Benlahsen, M
机构：
[1] Fac Sci Amiens, Phys Mat Condensee Lab, F-80039 Amiens 2, France
[2] CNRS, UMR 8635, Lab Phys Solides & Cristallogeneses, F-92195 Meudon, France
来源：
SURFACE & COATINGS TECHNOLOGY | 2002年 / 151卷
关键词：
disordered systems; carbon nitride; thin films; optical properties;
D O I：
10.1016/S0257-8972(01)01659-0
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Analysis of carbon nitride films (CN) deposited by RF magnetron sputtering on (100) silicon wafers, under different target self-bias, is reported. The properties of as-deposited films were determined using X-ray photoelectron spectroscopy (XPS), IR absorption, Raman spectra, transmission spectroscopy and photothermal deflexion spectroscopy (PDS). The presence of various types of C-N bond, as well as of hydrogen and oxygen, was revealed. Good correlation was observed between the variation of nitrogen content (N/C ratio), the optical gap and the Raman features as a function of the target bias. The optical gap decrease is c discussed in terms of N/C ratio evolution and the sp(2) content. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：242 / 246
页数：5
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