Modeling of filament discharge development in a XeCl excimer laser

被引：0
|
作者：
Akashi, H [1 ]
Sakai, Y
Takahashi, N
Sasaki, T
机构：
[1] Natl Def Acad, Dept Appl Phys, Kanagawa 2398686, Japan
[2] Hokkaido Univ, Grad Sch Engn, Sapporo, Hokkaido 0608628, Japan
来源：
IEEE TRANSACTIONS ON PLASMA SCIENCE | 1999年 / 27卷 / 01期
关键词：
filament discharge; gas temperature; modeling; XeCl excimer laser;
D O I：
10.1109/27.762993
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Dynamics of a filament discharge in a discharge-excited XeCl excimer laser medium has been simulated for a sequence of discharge pulses (shots), In the present model a filament discharge is triggered at a microprotrusion on cathode surface. After the first discharge initiation, a hot spot is created near the cathode, then filament develops toward the anode in the second shot. Images of the filament discharge development and its properties in a XeCl excimer laser are presented.
引用
收藏
页码：8 / 9
页数：2
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