DISCHARGE MEDIUM UNIFORMITY INFLUENCE ON XECL EXCIMER LASER-BEAM QUALITY

被引：4
|
作者：
DILAZZARO, P
LETARDI, T
ZHENG, CE
机构：
[1] Dipartimento Sviluppo Tecnologie di Punta, ENEA, Area INN, Roma, 00044, Frascati
来源：
NUOVO CIMENTO DELLA SOCIETA ITALIANA DI FISICA D-CONDENSED MATTER ATOMIC MOLECULAR AND CHEMICAL PHYSICS FLUIDS PLASMAS BIOPHYSICS | 1992年 / 14卷 / 01期
关键词：
D O I：
10.1007/BF02455343
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Starting with the geometrical optics approximation, the influence of the discharge and of the gas flow nonuniformities on the excimer laser beam propagation quality is discussed.
引用
收藏
页码：41 / 48
页数：8
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