Infrared micropolarizer array fabricated using a reversal nanoimprint

被引：13
|
作者：
Zeng, Xiangwei [1 ]
Chu, Jinkui [1 ]
Kang, Weidong [1 ]
Zhang, Ran [1 ]
机构：
[1] Dalian Univ Technol, Coll Mech Engn, Dalian 116024, Peoples R China
来源：
APPLIED OPTICS | 2018年 / 57卷 / 07期
基金：
中国国家自然科学基金;
关键词：
WIRE-GRID POLARIZER; IMAGING POLARIMETRY; OPTICAL-PROPERTIES; SURFACES; SENSORS; METALS; FE; PB; NI; AU;
D O I：
10.1364/AO.57.001530
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Using a reversal nanoimprint and metal evaporation process, we fabricated a micropolarizer array for the 2.5-7 mu m wavelength region. The micropolarizer array has a unique unit, which is composed of 2 x 3 arrays on an intrinsic silicon substrate. Each array consists of a 200 nm period bilayer Al grating in a 1.3 mm x 1.3 mm aperture. The transmittance of transverse magnetic polarization of each array is greater than 65% in the 2.5-7 mu m wavelength range, and the extinction ratio is over 35 dB in the 3-4 mu m and 6-7 mu m wavelength range. This fabricated micropolarizer array has lower costs and better compatibility with microfabrication processes. (C) 2018 Optical Society of America
引用
收藏
页码：1530 / 1533
页数：4
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