Solubility of nitrogen in binary III-V systems

被引:115
|
作者
Ho, IH
Stringfellow, GB
机构
[1] UNIV UTAH,DEPT MAT SCI & ENGN,SALT LAKE CITY,UT 84112
[2] UNIV UTAH,DEPT ELECT ENGN,SALT LAKE CITY,UT 84112
关键词
nitride alloys; N solubility; solubility; thermodynamics; GaInN;
D O I
10.1016/S0022-0248(97)00078-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A version of the valance-force-field (VFF) model has been developed specifically for the calculation of the nitrogen solubility in conventional III-V binary compounds. At very low N concentrations, i.e., in the dilute limit, the atoms surrounding the N are allowed to relax. It is found that the energy due to bond stretching and bond bending is lowered and the solubility limit is increased substantially when both sublattices are allowed to relax to distances as large as the sixth nearest neighbor positions. Using this model, the equilibrium mole fraction of N in GaP was calculated to be 6 x 10(-7) cm(-3) at 700 degrees C, which agrees with experimental data and closely approximates the results of the semi-empirical delta-lattice parameter model. It is more than three orders of magnitude larger than the result obtained using the simplest VFF model with relaxation of only the first neighbor bonds. Other nitride systems such as GaAsN, AlPN, AlAsN, InPN, and InAsN were investigated as well. The equilibrium mole fraction of nitrogen in InAs is the highest (about 0.002 at 700 degrees C). A miscibility gap is also predicted for the commercially important GaInN system.
引用
收藏
页码:1 / 7
页数:7
相关论文
共 50 条
  • [41] Thermal etching of binary and ternary III-V compounds under vacuum conditions
    Alexeev, AN
    Karpov, SY
    Maiorov, MA
    Myachin, VE
    Pogorelsky, YV
    Sokolov, IA
    JOURNAL OF CRYSTAL GROWTH, 1996, 166 (1-4) : 167 - 171
  • [42] Elastic layered waves in (001) III-V nitride systems
    Ouchani, N.
    Nougaoui, A.
    Velasco, V. R.
    Aynaou, H.
    Bria, D.
    El Boudouti, E. H.
    PHYSICAL REVIEW B, 2006, 74 (03):
  • [43] III-V on a Si platform for the next generations of communication systems
    Parvais, B.
    Vais, A.
    Yadav, S.
    Mols, Y.
    Vermeersch, B.
    Kodanarama, K. Vondkar
    Boccardi, G.
    Kunert, B.
    Collaert, N.
    6TH IEEE ELECTRON DEVICES TECHNOLOGY AND MANUFACTURING CONFERENCE (EDTM 2022), 2022, : 250 - 252
  • [44] MICROSCOPIC CAPACITORS AND NEUTRAL INTERFACES IN III-V/IV/III-V SEMICONDUCTOR HETEROSTRUCTURES
    BIASIOL, G
    SORBA, L
    BRATINA, G
    NICOLINI, R
    FRANCIOSI, A
    PERESSI, M
    BARONI, S
    RESTA, R
    BALDERESCHI, A
    PHYSICAL REVIEW LETTERS, 1992, 69 (08) : 1283 - 1286
  • [45] Surface-reconstruction-enhanced solubility of N, P, As, and Sb in III-V semiconductors
    Zhang, SB
    Zunger, A
    APPLIED PHYSICS LETTERS, 1997, 71 (05) : 677 - 679
  • [46] III-V heterostructure microelectronics for electronic and optoelectronic systems in Europe
    Scavennec, A
    Lefevre, R
    SOLID-STATE ELECTRONICS, 1997, 41 (10) : 1389 - 1396
  • [47] Nanostructures and surface reconstructions in Mn/III-V systems and MnSb
    Wang, Haiyuan
    Ouserigha, Collins
    Burrows, Christopher W.
    Bell, Gavin R.
    2016 COMPOUND SEMICONDUCTOR WEEK (CSW) INCLUDES 28TH INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE & RELATED MATERIALS (IPRM) & 43RD INTERNATIONAL SYMPOSIUM ON COMPOUND SEMICONDUCTORS (ISCS), 2016,
  • [48] III-V nanowires for optoelectronies
    Kim, Yong
    Gao, Q.
    Joyce, H. J.
    Tan, H. H.
    Jagadish, C.
    Paladugu, M.
    Zou, J.
    OPTOELETRONIC MATERIALS AND DEVICES, PTS 1 AND 2, 2006, 6352
  • [49] Ferromagnetic III-V heterostructures
    Ohno, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (04): : 2039 - 2043
  • [50] Silicon and III-V nanoelectronics
    Datta, S
    Chau, R
    2005 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, 2005, : 7 - 8