Spectroscopic Characterization of Si/Mo Thin-film Stack at Extreme Ultraviolet Range

被引：0
|
作者：
Li, Yen-Yin [1 ]
Lee, Yin-Wen [2 ]
Wu, I-Chou [1 ]
Huang, Sheng-Lung [1 ,3 ]
机构：
[1] Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
[2] Natl Taipei Univ Technol, Dept Electroopt Engn, Taipei 10608, Taiwan
[3] Natl Taiwan Univ, Dept Elect Engn, Taipei 106, Taiwan
来源：
2017 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2017年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A common-path interferometry based extreme ultraviolet (EUV) spectrometer was used to characterize a Si/Mo thin-film beamsplitter. The complex transfer function of the Si/Mo stack was successfully obtained and verified near the pristine 13.5-nm wavelength range.
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