This paper deals with crosstalk analysis of a CMOS driven capacitively and inductively coupled interconnect. The Alpha Power Law model of MOS transistor is used to represent a CMOS driver. This is combined with a transmission line-based coupled RLC model of interconnect to develop a composite model for analytical purpose. On this basis a transient analysis of crosstalk noise is carried out. Comparison of the analytical results with SPICE extracted results shows that the error involved is nominal. (C) 2008 Elsevier Ltd. All rights reserved.
机构:
Department of ECE, Meerut Institute of Engineering and Technology,Meerut, IndiaDepartment of ECE, Meerut Institute of Engineering and Technology,Meerut, India
Devendra Kumar Sharma
Brajesh Kumar Kaushik
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Department of Electronics & Computer Engineering, Indian Institute of Technology,Roorkee, IndiaDepartment of ECE, Meerut Institute of Engineering and Technology,Meerut, India
Brajesh Kumar Kaushik
R.K.Sharma
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Department of ECE, National Institute of Technology,Kurukshetra, Haryana, IndiaDepartment of ECE, Meerut Institute of Engineering and Technology,Meerut, India
机构:
Department of ECE, Meerut Institute of Engineering and Technology,Meerut, IndiaDepartment of ECE, Meerut Institute of Engineering and Technology,Meerut, India
Devendra Kumar Sharma
Brajesh Kumar Kaushik
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Department of Electronics & Computer Engineering, Indian Institute of Technology,Roorkee, IndiaDepartment of ECE, Meerut Institute of Engineering and Technology,Meerut, India
Brajesh Kumar Kaushik
RKSharma
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Department of ECE, National Institute of Technology,Kurukshetra, Haryana,Department of ECE, Meerut Institute of Engineering and Technology,Meerut, India
机构:
School of Physics Science and Technology,Jiangsu Key Laboratory of Thin Films,Soochow UniversitySchool of Physics Science and Technology,Jiangsu Key Laboratory of Thin Films,Soochow University
吴雪梅
宁兆元
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School of Physics Science and Technology,Jiangsu Key Laboratory of Thin Films,Soochow UniversitySchool of Physics Science and Technology,Jiangsu Key Laboratory of Thin Films,Soochow University