Electron beam evaporation of boron at forevacuum pressures for plasma-assisted deposition of boron-containing coatings

被引：19

作者：

Yushkov, Yu. G. ^{[1
,2
]}

Tyunkov, A. V. ^{[1
,2
]}

Oks, E. M. ^{[1
,2
]}

Zolotukhin, D. B. ^{[1
]}

机构：

[1] Tomsk State Univ Control Syst & Radioelect, Tomsk 634050, Russia

[2] Russian Acad Sci, Inst High Current Elect, Tomsk 634055, Russia

来源：

JOURNAL OF APPLIED PHYSICS | 2016年 / 120卷 / 23期

基金：

俄罗斯科学基金会;

关键词：

FILMS; IRRADIATION; RANGE; ARC;

D O I：

10.1063/1.4972268

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We describe the use of a plasma-cathode electron source for electron beam evaporation of boron at forevacuum pressures (similar to 10 Pa) with subsequent deposition of boron-containing coatings on a titanium substrate. We analyze the process of electron beam heating and evaporation of boron, study the mass-to-charge composition of the gas and boron beam-produced plasma, apply such plasma for coating deposition, and investigate the elemental composition of the deposited film and its microhardness. Published by AIP Publishing.

引用

页数：5

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