PLASMA-ASSISTED DEPOSITION OF NANOSTRUCTURED FILMS AND COATINGS

被引：1
|
作者：
Girshick, Steven L. [1 ]
机构：
[1] Univ Minnesota, Dept Mech Engn, Minneapolis, MN 55455 USA
来源：
HIGH TEMPERATURE MATERIAL PROCESSES | 2011年 / 15卷 / 04期
基金：
美国国家科学基金会;
关键词：
nanoparticles; nanostructured films; hypersonic plasma particle deposition; plasma spraying; dusty plasmas; SILICON; POWDERS;
D O I：
10.1615/HighTempMatProc.v15.i4.50
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Recent work is reviewed on plasma-assisted deposition of nanostructured films and coatings. Several methods are being developed. These include conventional plasma spray in which nanostructure is induced in the coarse feed powder by mechanical milling before spraying; thermal plasma spray pyrolysis; plasma flash evaporation of fine powders injected into an RF torch; hypersonic plasma particle deposition; and low-pressure plasma synthesis and deposition of nanoparticles to produce thin films.
引用
收藏
页码：293 / 298
页数：6
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