A subthreshold surface potential model for short-channel MOSFET taking into account the varying depth of channel depletion layer due to source and drain junctions
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作者:
Baishya, S
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Jadavpur Univ, Dept Elect & Telecommun Engn, Kolkata 700032, W Bengal, IndiaJadavpur Univ, Dept Elect & Telecommun Engn, Kolkata 700032, W Bengal, India
Baishya, S
[1
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Mallik, A
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机构:Jadavpur Univ, Dept Elect & Telecommun Engn, Kolkata 700032, W Bengal, India
Mallik, A
Sarkar, CK
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机构:Jadavpur Univ, Dept Elect & Telecommun Engn, Kolkata 700032, W Bengal, India
Sarkar, CK
机构:
[1] Jadavpur Univ, Dept Elect & Telecommun Engn, Kolkata 700032, W Bengal, India
[2] Kalyani Govt Engn Coll, Dept Elect & Commun Engn, Kalyani 741235, W Bengal, India
An analytical subthreshold surface potential model for short-channel MOSFET is presented. In this model, the effect of varying depth of the channel depletion layer on the surface potential has been considered. The effect of the depletion layers around the source and drain junctions on the surface potential, which is very important for short channel devices is included in this model. With this, the drawback of the existing models that assume a constant channel depletion layer thickness is removed resulting in a more accurate prediction of the surface potential. A pseudo-two-dimensional method is adopted to retain the accuracy of two-dimensional analysis yet resulting in a simpler manageable one-dimensional analytical expression. The subthreshold drain current is also evaluated utilizing this surface potential model.