Detailed modeling of low-temperature alkane oxidation: High-pressure rate rules for alkyl+O2 reactions

被引：0
|
作者：
Villano, Stephanie M. [1 ]
Huynh, Lam K. [2 ,3 ]
Carstensen, Hans-Heinrich [4 ]
Dean, Anthony M. [1 ]
机构：
[1] Colorado Sch Mines, Dept Chem & Biol Engn, Golden, CO 80401 USA
[2] Vietnam Natl Univ, Int Univ, HCMC, Hanoi, Vietnam
[3] Vietnam Natl Univ, Int Univ, Inst Computat Sci & Technol HCMC, Hanoi, Vietnam
[4] Univ Ghent, Chem Technol Lab, B-9000 Ghent, Belgium
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2013年 / 245卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
186-PHYS
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页数：1
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