Detailed modeling of low-temperature alkane oxidation: High-pressure rate rules for alkyl+O2 reactions

被引：0

作者：

Villano, Stephanie M. ^{[1
]}

Huynh, Lam K. ^{[2
,3
]}

Carstensen, Hans-Heinrich ^{[4
]}

Dean, Anthony M. ^{[1
]}

机构：

[1] Colorado Sch Mines, Dept Chem & Biol Engn, Golden, CO 80401 USA

[2] Vietnam Natl Univ, Int Univ, HCMC, Hanoi, Vietnam

[3] Vietnam Natl Univ, Int Univ, Inst Computat Sci & Technol HCMC, Hanoi, Vietnam

[4] Univ Ghent, Chem Technol Lab, B-9000 Ghent, Belgium

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2013年 / 245卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

186-PHYS

引用

页数：1

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