INDUCTIVELY COUPLED PLASMA ETCHING OF GA AS IN CL2/AR/O2 CHEMISTRY WITH PHOTO RESIST MASK

被引：0
|
作者：
Liu, K. [1 ]
Ren, X. M. [1 ]
Huang, Y. Q. [1 ]
Cai, Sh. W. [1 ]
Duan, X. F. [1 ]
Wang, Q. [1 ]
Kang, Ch. [1 ]
Li, J. Sh. [1 ]
Chen, Q. T. [1 ]
Fei, J. R. [1 ]
机构：
[1] Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing, Peoples R China
来源：
2016 43RD IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS) | 2016年
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中图分类号：
T [工业技术];
学科分类号：
08 ;
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页数：1
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