Metrologic platform with a modulation interference microscope

被引：1
|
作者：
Loparev, A. V. [1 ]
Pravdivtsev, A. V. [1 ]
Ignat'ev, P. S. [1 ]
Indukaev, K. V. [1 ]
Osipov, P. A. [1 ]
Romash, E. V. [2 ]
机构：
[1] OOO Amphora Labs, Moscow, Russia
[2] Moscow State Tech Univ STANKIN, FGBOU VPO, Moscow, Russia
来源：
JOURNAL OF OPTICAL TECHNOLOGY | 2012年 / 79卷 / 06期
关键词：
FLATNESS; PHASE;
D O I：
10.1364/JOT.79.000371
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
This paper presents the results of the development of a unique metrologic platform intended for the study of the nanodefects of an object and the measurement of its surface flatness on large areas. The design of the platform is based on the simultaneous use of modulation interference microscopy and noncontact aeromagnetic guides. The optical layout and an algorithm for obtaining panoramic images are considered. It is shown to be promising to use the metrologic platform in the optics and semiconductor industries. (C) 2012 Optical Society of America.
引用
收藏
页码：371 / 375
页数：5
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