The effect of the partial pressure of H2 gas and atomic hydrogen on diamond films deposited using CH30H/H2O gas

被引：0
|
作者：
Lee, KJ [1 ]
Koh, JG
Shin, JS
Kwon, KH
机构：
[1] Soongsil Univ, Dept Phys, Seoul 156013, South Korea
[2] Daejeon Univ, Dept Adv Mat Engn, Taejon 300716, South Korea
[3] Hyejeon Coll, Dept Ind Engn, Hongsung 350702, South Korea
来源：
JOURNAL OF THE KOREAN PHYSICAL SOCIETY | 2006年 / 48卷 / 01期
关键词：
HFCVD; CH3OH/H2O gas; diamond; OES; H-alpha; H-beta; H-gamma;
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Diamond films were deposited on Si(100) substrates by hot filament chemical vapor deposition (HFCVD) with a CH3OH/H2O gas mixture while changing the gas ratio. The films were analyzed with scanning electron microscopy (SEM), Raman spectroscopy, and optical emission spectroscopy (OES). The diamond films were grown with CH3OH being 52% by volume of the gas mixture. The effect of atomic hydrogen on the film was different from that of the CH4/H-2 gas mixture. Analysis with OES during film growth indicated that among the thermally dissociated hydrogen radicals, only H. contributed to the etching of graphite.
引用
收藏
页码：141 / 145
页数：5
相关论文
共 50 条
  • [21] The Effect of Pressure on the Dissociation of H2/CH4Gas Mixture during Diamond Films Growth via Chemical Vapor Deposition
    赵庆勋
    辛红丽
    韩佳宁
    文钦若
    杨景发
    Plasma Science & Technology, 2002, (01) : 1113 - 1118
  • [22] Effect of pressure on nanocrystalline diamond films deposition by hot filament CVD technique from CH4/H2 gas mixture
    Liang, Xingbo
    Wang, Lei
    Zhu, Hongliang
    Yang, Deren
    SURFACE & COATINGS TECHNOLOGY, 2007, 202 (02): : 261 - 267
  • [23] Antiproton stopping in H2 and H2O
    Bailey, J. J.
    Kadyrov, A. S.
    Abdurakhmanov, I. B.
    Fursa, D. V.
    Bray, I.
    PHYSICAL REVIEW A, 2015, 92 (05):
  • [24] Dipolar H2 activation by H2O
    Oiestad, EL
    Uggerud, E
    CHEMICAL COMMUNICATIONS, 2000, (10) : 831 - 832
  • [25] CHARACTERIZATION OF DIAMOND FILMS DEPOSITED USING C3H6OX-H2 GAS-MIXTURES
    CHEN, CF
    CHEN, SH
    HONG, TM
    WU, SH
    DIAMOND AND RELATED MATERIALS, 1993, 2 (5-7) : 732 - 736
  • [26] Is H2O a liquid, or water a gas?
    Soames, Scott
    PHILOSOPHY AND PHENOMENOLOGICAL RESEARCH, 2006, 72 (03) : 635 - 639
  • [27] Direct H2O2 Synthesis, without H2 Gas
    Huang, Aoxue
    Delima, Roxanna S.
    Kim, Yongwook
    Lees, Eric W.
    Parlane, Fraser G. L.
    Dvorak, David J.
    Rooney, Michael B.
    Jansonius, Ryan P.
    Fink, Arthur G.
    Zhang, Zishuai
    Berlinguette, Curtis P.
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2022, 144 (32) : 14548 - 14554
  • [28] On the kinetics of oscillating reactions: H2/O2 and H2/H2O on platinum
    Sieben, B.
    Bozdech, G.
    Ernst, N.
    Block, J.H.
    Surface Science, 1996, 352-354 : 167 - 172
  • [29] REDUCTION OF SOLID WUSTITE IN H2/H2O/CO/CO2 GAS-MIXTURES
    FARREN, M
    MATTHEW, SP
    HAYES, PC
    METALLURGICAL TRANSACTIONS B-PROCESS METALLURGY, 1990, 21 (01): : 135 - 139
  • [30] Kinetics of Iron Oxide Reduction in H2/H2O Gas Mixture: Global and Stepwise Reduction
    Garg, Pritesh
    Hu, Xiaojun
    Li, Yuan
    Li, Kejiang
    Nag, Samik
    Zhang, Jianliang
    METALLURGICAL AND MATERIALS TRANSACTIONS B-PROCESS METALLURGY AND MATERIALS PROCESSING SCIENCE, 2022, 53 (03): : 1759 - 1774
12345